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Plasma-induced chemical etching generating Ni_(3)S_(2) for formaldehyde detection

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Chinese chemical Letters 2022年第6期33卷 3035-3038页

作者： Jiaxin Zhou Li Zhao Qiang Wang Lixin Zuo Ana Zhao Huimin Yu Xue Jiang Xiaoli Xiong College of Chemistry and Materials Science Sichuan Normal UniversityChengdu 610068China

In this paper,Ni_(3)S_(2)nanosheet(NS)was generated by chemical etching with sodium sulfide directly on the nickel foam(NF),which was induced by dielectric barrier discharge plasma in liquid.Compared with other chemical etching methods of nickel-based nanomaterials,this method was not only rapid(40 min)and mild(at room temperature and atmospheric pressure),but also showed consistent stability and good reproducibility.The Ni_(3)S_(2)NS/NF electrode showed excellent performance in the electrochemical detection of formaldehyde under alkaline conditions.It had a good linear relationship with the concentration of formaldehyde in the range of 0.002-5.45 mmol/L(R^(2)=0.9957)and the limit of detection(LOD)was 1.23μmol/L(S/N=3).The sensitivity was 1286.9μA L mmol^(–1)cm^(–2),and the response time was about 5 s.The plasma-induced chemical etching strategy provides a simple and stable electrode preparation method,which has great application prospects in nonenzymatic electrochemical sensors.

关键词： chemical etching Microplasma Electrochemical detection Formaldehyde

chemical etching of a GaSb crystal incorporated with Mn grown by the Bridgman method under microgravity conditions

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Journal of Semiconductors 2009年第8期30卷 47-51页

作者：陈晓锋陈诺夫吴金良张秀兰柴春林俞育德 Key Laboratory of Semiconductor Materials and Devices Institute of SemiconductorsChinese Academy of Sciences National Laboratory of Microgravity Institute of MechanicsChinese Academy of Sciences

A GaSb crystal incorporated with Mn has been grown by the Bridgman method on the Polizon facility onboard the FOTON-M3 spacecraft. Structural defects and growth striations have been successfully revealed by the chemical etching method. By calculating various parameters of the convection, the striation patterns can be explained, and the critical value of the Taylor number, which characterizes the convective condition of the rotating magnetic field induced azimuthal flow, was shown. The stresses generated during crystal growth can be reflected by the observations of etch pit distribution and other structural defects. Suggestions for improving the space experiment to improve the quality of the crystal are given.

关键词： chemical etching etch pit defect growth striations convection

Fabrication of Submicron-Diameter and Taper Fibers Using chemical etching

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Journal of Materials Science & Technology 2012年第4期28卷 308-312页

作者： Hani J. Kbashi Department of Physics College of Science University of Baghdad Baghdad Al-Jadriya-10070 Iraq

The thin, long length and high smoothness silica photonic nanowires and taper optical fiber were fabricated using a simple and low cost chemical etching method. A two-steps wet etch process were used consisting of etching with 30% HF acid to remove cladding and 24% HF acid to decrease fiber core diameter. An approach for on-line monitoring of etching using 1300 nm light power transmitted in the optical fiber was used to determine the diameter of the remaining core and showed a transition between two different operation regimes of nanofiber from the embedded regime, where the mode was isolated from the environment, to the evanescent regime. The data indicated that the diameter of the silica fiber decreased linearly for both 30% and 24% HF acid with 1.2 and 0.1/zm/min grad diameter, respectively at room temperature, and more than 70% of the mode intensity could propagate outside fiber when the core diameter was less than 1μm. The results of fiber taper showed that the fiber was tapered by a factor of 20 while retaining a thin core structure and leaving about more than 85% of core structure.

关键词： chemical etching Submicron fiber Taper fibers

Characterization and Wettability of ZnO Film Prepared by chemical etching Method

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chemical Research in Chinese Universities 2013年第2期29卷 333-337页

作者： GUO Hua-xi JIA Hui-ying ZENG Jian-bo CONG Qian REN Lu-quan Key Laboratory of Bionic Engineering Ministry of Education Jilin University Changchun 130025 P. R. China

ZnO thin films were prepared by a chemical etching method and their wettability was investigated. The structure and surface composition structure were characterized by means of scanning electron microscopy, X-ray photoelectronic spectrometry（XPS）, X-ray diffraction（XRD） and Raman spectrometry. These analyses reveal that the etched films were large-scale micro-nanohierarchical structures composed of a Zn core and a ZnO coating. Superhy- drophobic surfaces with water contact angles of over 150~ were obtained by n-octadecanethiol（ODT） modification. The XPS and Raman results indicate that ODT molecules were bound to the ZnO surface with the S head group by forming Zn--S bond.

关键词： ZnO chemical etching Micro-nanostructure Raman spectrometry Wettability

OFHC copper substrates for niobium sputtering:comparison of chemical etching recipes

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Radiation Detection Technology and Methods 2020年第2期4卷 139-146页

作者： Fuyu Yang Pei Zhang Jin Dai Zhongquan Li Institute of High Energy Physics Chinese Academy of SciencesBeijing 100049China University of Chinese Academy of Sciences Beijing 100049China

Purpose Niobium sputtered on copper has been a popular alternative approach for superconducting radio frequency(SRF)community in the last few decades.Comparing to bulk materials of a few millimeters,high-purity niobium of merely a few microns is sufficient to realize superconductivity on the coated surface.Being niobium thin film,it has been widely acknowledged that surface quality of the substrate plays a vital role in obtaining a superior niobium coating with excellent SRF performance.Therefore,proper chemical treatment of the substrate before coating is crucial and the ultimate goal is to create a smooth and defect-free surface.Prior to the design of a cavity etching system,the mechanism of SUBU as well as two industry-used solutions is studied in detail on samples.Methods Copper samples were first pre-treated by mechanical grinding to remove fabrication damages,obvious defects and visible impurities.Two chemical solutions widely used in industries were subsequently chosen to etch the samples.Finally,the established SUBU solution was used independently on these pre-treated samples for comparison.Surface morphology and etching rate were measured accordingly.Results and conclusions Mirror-like copper surface was created by using the SUBU solution thus qualified for subsequent niobium sputtering,while the other two solutions used in industries were less effective with nonideal surface morphology.The chemical reactions,the experimental requisites and the involved processes are extensively elucidated for all three solutions.Limitations for SUBU were examined,and the optimum ratio of the chemical bath volume to sample surface area was also determined.These investigations will serve as an important guidance for the development of a chemical etching system for elliptical copper cavities.

关键词： chemical etching Copper substrate Dilute sulfuric acid SUBU Surface roughness

Application of Wet chemical etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays

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Journal of Semiconductors 2000年第1期21卷 22-27页

作者：王杏华宋爱民程文超李国华李承芳李月霞谭平恒中科院半导体所半导体超晶格国家重点实验室北京 1 0 0 0 83

Two types of GaAs/AlGaAs quantum dot arrays with different dot size are fabricated by dry etching and dry\|wet etching. PL spectra of the quantum dot arrays at low temperature show the blue shifts due to the quantization confinement effects, and the blue\|shift increases with the decrease of the dot size. It is also found that wet chemical etching can reduce the surface damage caused by high\|energy ion etching and improve the optical characteristics of the quantum dot arrays.

关键词： Quantum Dot Arrays chemical etching

The etching of a-plane GaN epilayers grown by metal-organic chemical vapour deposition

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Chinese Physics B 2010年第10期19卷 458-462页

作者：许晟瑞郝跃张进成周小伟曹艳荣欧新秀毛维杜大超王昊 School of Microelectronics Xidian University School of Electronical & Mechanical Engineering Xidian University

Morphology of nonpolar （1120） a-plane GaN epilayers on r-plane （1102） sapphire substrate grown by low-pressure metal-organic vapour deposition was investigated after KOH solution etching. Many micron- and nano-meter columns on the a-plane GaN surface were observed by scanning electron microscopy. An etching mechanism model is proposed to interpret the origin of the peculiar etching morphology. The basal stacking fault in the a-plane GaN plays a very important role in the etching process.

关键词： crystal morphology stacking fault nonpolar GaN chemical etching

Superhydrophobic Copper Surface by a chemical etching without Hydrophobic Coating

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Superhydrophobic Copper Surface by a Chemical Etching withou...

chemical etching Fabrication of Mesoporous Bi2O3@Bi Nanospheres with High Visible-Light-Activity

2011 World Congress on Engineering and Technology(CET 2011)

作者： Zhijun Chen Haiyan Zhu Qingxiang Yang Yabing Guo Jiangwei Zhang Shaoming Fang Henan Provincial Key Laboratory of Surface and Interface Science Zhengzhou University of Light Industry Zhengzhou P.R.China

In this letter,we developed a simple and feasible method for fabricating a superhydrophobic copper surface by immersing the copper sheet in mixed acid solution composed of Hydrofluoric acid （HF）,Hydrochloric acid （HCl）,and nitric acid （HNO3） without additional combination with hydrophobic materials.The resultant surfaces were characterized by scanning electron microscopy,water contact angle （WCA） measurement,and optical methods.The etched surfaces have ribbon protuberances structure consisting of some irregular micro- and nanometer scales protuberances.The resulting surface exhibited super-hydrophobic properties with a high water contact angle of 158.6° and a low water sliding angle （WSA） of 6°.

关键词： Copper Superhydrophobicity chemical etching Trap air

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Chemical Etching Fabrication of Mesoporous Bi2O3@Bi Nanosphe...