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Recent advances in preparation of metallic superhydrophobic surface by chemical etching and its applications

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Chinese Journal of chemical Engineering 2023年第9期61卷 221-236页

作者： Shitong Zhu Wenyi Deng Yaxin Su College of Environmental Science and Engineering Donghua UniversityShanghai 201620China

In the past few decades,inspired by the superhydrophobic surfaces(SHPS)of animals and plants such as lotus leaves,rose petals,legs of water striders,and wings of butterflies,preparing metal materials with metallic SHPS(MSHPS)have attracted great research interest,due to the great prospect in practical *** obtain SHPS on conventional metal materials,it is necessary to construct rough surface,followed by modification with low surface energy *** this paper,the action mechanism and the current research status of MSHPS were reviewed through the following ***,the model of wetting theory was presented,and then the progress in MSHPS preparation through chemical etching method was ***,the applications of MSHPS in self-cleaning,anti-icing,corrosion resistance,drag reduction,oil-water separation,and other aspects were ***,the challenges encountered in the present application of MSHPS were summarized,and the future research interests were discussed.

关键词： Metal Superhydrophobic surface chemical etching Low adhesion Self-cleaning

Fabrication of Submicron-Diameter and Taper Fibers Using chemical etching

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Journal of Materials Science & Technology 2012年第4期28卷 308-312页

作者： Hani J. Kbashi Department of Physics College of Science University of Baghdad Baghdad Al-Jadriya-10070 Iraq

The thin, long length and high smoothness silica photonic nanowires and taper optical fiber were fabricated using a simple and low cost chemical etching method. A two-steps wet etch process were used consisting of etching with 30% HF acid to remove cladding and 24% HF acid to decrease fiber core diameter. An approach for on-line monitoring of etching using 1300 nm light power transmitted in the optical fiber was used to determine the diameter of the remaining core and showed a transition between two different operation regimes of nanofiber from the embedded regime, where the mode was isolated from the environment, to the evanescent regime. The data indicated that the diameter of the silica fiber decreased linearly for both 30% and 24% HF acid with 1.2 and 0.1/zm/min grad diameter, respectively at room temperature, and more than 70% of the mode intensity could propagate outside fiber when the core diameter was less than 1μm. The results of fiber taper showed that the fiber was tapered by a factor of 20 while retaining a thin core structure and leaving about more than 85% of core structure.

关键词： chemical etching Submicron fiber Taper fibers

Selective removal technology using chemical etching and excimer assistance in precision recycle of color filter

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Transactions of Nonferrous Metals Society of China 2011年第A01期21卷 210-214页

作者： Pai-shan PA Digital Content Design Graduate School of Toy and Game Design National Taipei University of Education Taipei City 10671 China

Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical etching, or electrochemical machining on the fifth generation TFT LCDs. The selective removal of microstructure layers from the color filter surface of an optoelectronic flat panel display, as well as complete removal of the ITO thin-films, RGB layer, or resin black matrix (BM) layer from the substrate is possible. Individual defective film layers can be removed, or all films down to the Cr layer or bare glass can be completely eliminated. Experimental results demonstrate that defective ITO thin-films, RGB layers, or the resin BM layer can now be recycled with a great precision. When the ITO or RGB layer proves difficult to remove, excimer light can be used to help with removal. During this recycling process, the use of 225 nm excimer irradiation before chemical etching, or electrochemical machining, makes removal of stubborn film residues easy, effectively improving the quality of recycled color filters and reducing fabrication cost.

关键词： chemical etching excimer light selective removal technology display color filter

Plasma-induced chemical etching generating Ni_(3)S_(2) for formaldehyde detection

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Chinese chemical Letters 2022年第6期33卷 3035-3038页

作者： Jiaxin Zhou Li Zhao Qiang Wang Lixin Zuo Ana Zhao Huimin Yu Xue Jiang Xiaoli Xiong College of Chemistry and Materials Science Sichuan Normal UniversityChengdu 610068China

In this paper,Ni_(3)S_(2)nanosheet(NS)was generated by chemical etching with sodium sulfide directly on the nickel foam(NF),which was induced by dielectric barrier discharge plasma in *** with other chemical etching methods of nickel-based nanomaterials,this method was not only rapid(40 min)and mild(at room temperature and atmospheric pressure),but also showed consistent stability and good *** Ni_(3)S_(2)NS/NF electrode showed excellent performance in the electrochemical detection of formaldehyde under alkaline *** had a good linear relationship with the concentration of formaldehyde in the range of 0.002-5.45 mmol/L(R^(2)=0.9957)and the limit of detection(LOD)was 1.23μmol/L(S/N=3).The sensitivity was 1286.9μA L mmol^(–1)cm^(–2),and the response time was about 5 *** plasma-induced chemical etching strategy provides a simple and stable electrode preparation method,which has great application prospects in nonenzymatic electrochemical sensors.

关键词： chemical etching Microplasma Electrochemical detection Formaldehyde

Characterization and Wettability of ZnO Film Prepared by chemical etching Method

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chemical Research in Chinese Universities 2013年第2期29卷 333-337页

作者： GUO Hua-xi JIA Hui-ying ZENG Jian-bo CONG Qian REN Lu-quan Key Laboratory of Bionic Engineering Ministry of Education Jilin University Changchun 130025 P. R. China

ZnO thin films were prepared by a chemical etching method and their wettability was investigated. The structure and surface composition structure were characterized by means of scanning electron microscopy, X-ray photoelectronic spectrometry（XPS）, X-ray diffraction（XRD） and Raman spectrometry. These analyses reveal that the etched films were large-scale micro-nanohierarchical structures composed of a Zn core and a ZnO coating. Superhy- drophobic surfaces with water contact angles of over 150~ were obtained by n-octadecanethiol（ODT） modification. The XPS and Raman results indicate that ODT molecules were bound to the ZnO surface with the S head group by forming Zn--S bond.

关键词： ZnO chemical etching Micro-nanostructure Raman spectrometry Wettability

chemical etching process of copper electrode for bioelectrical impedance technology

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Transactions of Nonferrous Metals Society of China 2012年第6期22卷 1501-1506页

作者：周伟宋嵘蒋乐伦许文平梁国开程德才刘灵蛟中山大学工学院广州510006

In order to obtain bioelectrical impedance electrodes with high stability, the chemical etching process was used to fabricate the copper electrode with a series of surface microstructures. By changing the etching processing parameters, some comparison experiments were performed to reveal the influence of etching time, etching temperature, etching liquid concentration, and sample sizes on the etching rate and surface microstructures of copper electrode. The result shows that the etching rate is decreased with increasing etching time, and is increased with increasing etching temperature. Moreover, it is found that the sample size has little influence on the etching rate. After choosing the reasonable etching liquid composition （formulation 3）, the copper electrode with many surface microstructures can be obtained by chemical etching process at room temperature for 20 rain. In addition, using the alternating current impedance test of electrode-electrode for 24 h, the copper electrode with a series of surface microstructures fabricated by the etching process presents a more stable impedance value compared with the electrocardiograph （ECG） electrode, resulting from the reliable surface contact of copper electrode-electrode.

关键词： bioelectrical impedance copper electrode chemical etching surface microstructures processing parameters

Application of Wet chemical etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays

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Journal of Semiconductors 2000年第1期21卷 22-27页

作者：王杏华宋爱民程文超李国华李承芳李月霞谭平恒中科院半导体所半导体超晶格国家重点实验室北京 1 0 0 0 83

Two types of GaAs/AlGaAs quantum dot arrays with different dot size are fabricated by dry etching and dry\|wet etching. PL spectra of the quantum dot arrays at low temperature show the blue shifts due to the quantization confinement effects, and the blue\|shift increases with the decrease of the dot size. It is also found that wet chemical etching can reduce the surface damage caused by high\|energy ion etching and improve the optical characteristics of the quantum dot arrays.

关键词： Quantum Dot Arrays chemical etching

OFHC copper substrates for niobium sputtering:comparison of chemical etching recipes

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Radiation Detection Technology and Methods 2020年第2期4卷 139-146页

作者： Fuyu Yang Pei Zhang Jin Dai Zhongquan Li Institute of High Energy Physics Chinese Academy of SciencesBeijing 100049China University of Chinese Academy of Sciences Beijing 100049China

Purpose Niobium sputtered on copper has been a popular alternative approach for superconducting radio frequency(SRF)community in the last few *** to bulk materials of a few millimeters,high-purity niobium of merely a few microns is sufficient to realize superconductivity on the coated *** niobium thin film,it has been widely acknowledged that surface quality of the substrate plays a vital role in obtaining a superior niobium coating with excellent SRF ***,proper chemical treatment of the substrate before coating is crucial and the ultimate goal is to create a smooth and defect-free *** to the design of a cavity etching system,the mechanism of SUBU as well as two industry-used solutions is studied in detail on *** Copper samples were first pre-treated by mechanical grinding to remove fabrication damages,obvious defects and visible *** chemical solutions widely used in industries were subsequently chosen to etch the ***,the established SUBU solution was used independently on these pre-treated samples for *** morphology and etching rate were measured *** and conclusions Mirror-like copper surface was created by using the SUBU solution thus qualified for subsequent niobium sputtering,while the other two solutions used in industries were less effective with nonideal surface *** chemical reactions,the experimental requisites and the involved processes are extensively elucidated for all three *** for SUBU were examined,and the optimum ratio of the chemical bath volume to sample surface area was also *** investigations will serve as an important guidance for the development of a chemical etching system for elliptical copper cavities.

关键词： chemical etching Copper substrate Dilute sulfuric acid SUBU Surface roughness

A novel colloid probe preparation method based on chemical etching technique

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Journal of Zhejiang University-Science B(Biomedicine & Biotechnology) 2006年第4期7卷 304-309页

作者： XU Hui XU Guo-hua AN Yue Department of chemical Engineering Zheflang University Hangzhou 310027 China

Several fundamental problems in hydrophobic force measurements using atomic force microscope (AFM) are dis-cussed in this paper. A novel method for colloid probe preparation based on chemical etching technology is proposed, which is specially fit for the unique demands of hydrophobic force measurements by AFM. The features of three different approaches for determining spring constants of rectangular cantilevers, including geometric dimension, Cleveland and Sader methods are com-pared. The influences of the sizes of the colloids on the measurements of the hydrophobic force curves are investigated. Our experimental results showed that by selecting colloid probe with proper spring constant and tip size, the hydrophobic force and the complete hydrophobic interaction force curve can be measured by using AFM.

关键词： Hydrophobic force Atomic force microscope (AFM) Colloid probe chemical etching