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Application of radiation chemistry to the construction of functional organic materials

辐射研究与辐射工艺学报 2005年第2期23卷 102-102页

作者： Tsuneki Ichikawa Hitoshi Koizumi Takahide Kimura Tohru Shimizu Division of Molecular Chemistry Graduate School of EngineeringHokkaido University Sapporo 060-8628 JapanDivision of Molecular Chemistry Graduate School of EngineeringHokkaido University Sapporo 060-8628 JapanDivision of Molecular Chemistry Graduate School of EngineeringHokkaido University Sapporo 060-8628 JapanDivision of Molecular Chemistry Graduate School of EngineeringHokkaido University Sapporo 060-8628 Japan

Although radiation-chemical reactions have been applied to many industrial fields, especially to polymer industries, they are mainly aimed at improving mechanical, thermal and surface properties of the materials. Application of radiation chemical reactions to the construction of functional organic materials, such as electronic and optical materials, is relatively few. However, radiation-chemical reactions have the following characteristics that are advantageous for studying and constructing functional organic materials.(1) The reactions take place even in solid without structural deformation, which is advantageous for modifying chemical and physical properties of precisely shaped solid substances.(2) The reactions take place within the region where the radiation energy is absorbed, so that only a part of a solid substance can be modified with precise spatial resolution. Moreover, the region is controllable three dimensionally by changing the field of exposure and the depth of penetration that depends on energy of the ionizing particles.(3) The reactions can be induced without additives, which is advantageous for maintaining purity of the *** would like to show how radiation chemical reactions are useful for the construction of functional organic materials by taking our recent studies on resist polymers for radiation lithography and carbon nano-fibers that are considered to be functional materials for next generation lithography and electronics, *** resist polymers synthesized were polyethylene and poly (methyl acrylate) with benzyl ester of carboxylic acid at the center of the polymer skeleton. Introduction of the benzyl ester to the polymer skeletons changed the polystyrene and the poly (methyl acrylate) from cross-link type to scission type polymers upon γ *** irradiation of the polymers resulted in binary change of the molecular weight, due to the dissociative capture of secondary electrons by the benzyl ester, asMnR1COOCH(C6H5)R

关键词：伽玛辐射氮离子束有机功能材料辐射化学感应

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