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检索条件"作者=thomas Frohlich"
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Foreword to the Special Issue on "Tip-and Laser-Based 3D Nanofabrication in Extended Macroscopic Working Areas"
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Nanomanufacturing and Metrology 2021年 第3期4卷 131-131页
作者: Eberhard Manske Rene Theska thomas frohlich Ingo Ortlepp Technische Universitat Ilmenau IlmenauGermany
The semiconductor industry has been following Moore’s law with astonishing continuation for 55 years *** is advancing from precision manufacturing,micromanufacturing,and nanomanufacturing toward atomic and close-to-a... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
Tip-and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas
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Nanomanufacturing and Metrology 2021年 第3期4卷 132-148页
作者: Ingo Ortlepp thomas frohlich Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern David Fischer Stephan Gorges Martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg Eberhard Manske Institute of Process Measurement and Sensor Technology Technische Universitat IlmenauEhrenbergstrasse 2998693 IlmenauGermany Control Engineering Group Technische Universitat IlmenauIlmenauGermany Optical Engineering Group.Technische Universitat Ilmenau IlmenauGermany Microsystems Technology Group.Technische Universitat Ilmenau IlmenauGermany Precision Engineering Group.Technische Universitat Ilmenau IlmenauGermany Compliant Systems Group Technische Universitat IlmenauIlmenauGermany Micro-and Nanoelectronic Systems Group Technische Universitat IlmenauIlmenauGermany Nanoscale Systems Group.Technische Universitat Ilmenau IlmenauGermany Division for Research Service and Technology Transfer Technische Universitat IlmenauIlmenauGermany Electronics Technology Group.Technische Universitat Ilmenau IlmenauGermany IMMS Institut flir Mikroelektronik-und Mechatronik-Systeme Gemeinniitzige GmbH(IMMS GmbH) IlmenauGermany Fachgebiet Technische Physik City University of Applied SciencesBremenGermany Lehrstuhl fiir Fertigungsmesstechnik Friedrich-Alexander-U niversitat(FAU)Erlangen-NiirnbergGermany JUMO GmbH&Co.KG FuldaGermany Asphericon GmbH JenaGermany
The field of optical lithography is subject to intense research and has gained enormous ***,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional *** effort and... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论