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检索条件"作者=david schaich martin friedrich"
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完全自动地进行优化
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流程工业 2005年 第8期 28-29页
作者: david schaich martin friedrich 拜耳技术服务公司流程管理技术部
不断增加的竞争压力,种类繁多的环保法规以及很高的能源和原材料价格,要求流程工业企业的设备能够经济高效的进行工作。对现有的生产设备来讲,可以通过生产流程的优化来达到工艺流程优化的目的。包括:提高产量、提高质量,提高设备... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
Endothelial dysfunction contributes to severe COVID-19 in combination with dysregulated lymphocyte responses and cytokine networks
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Signal Transduction and Targeted Therapy 2022年 第1期7卷 243-257页
作者: Louisa Ruhl Isabell Pink Jenny F.Kiihne Kerstin Beushausen Jana Keil Stella Christoph Andrea Sauer Lennart Boblitz Julius Schmidt Sascha david Hans-martin Jack Edith Roth Markus Cornberg Thomas F.Schulz Tobias Welte Marius M.Hoper Christine S.Falk Institute of Transplant Immunology MHHDHanoverGermany Department of Pneumology MHHDHanoverGermany Department of Intensive Care Medicine University of ZurichCHZurichSwitzerland Division of Molecular Immunology Internal Medicine IIINikolaus-Fiebiger-Center of Molecular MedicineFriedrich-Alexander University Erlangen-NurnbergDErlangenGermany Department of Gastroenterology Hepatology and Endocrinology MHHDHanoverGermany Center for Individualized Infection Medicine CiiM HanoverGermany lnstitute of Virology MHHDHanoverGermany German Center for Infection Research DZIFTTU-IICHMarburgGermany Excellence Cluster 2155 RESIST MHHHanoverGermany German Center for Lung Diseases DZL/BREATH MarburgGermany
The systemic processes involved in the manifestation of life・threatening COVID-19 and in disease recovery are still incompletely understood,despite investigations focusing on the dysregulation of immune responses afte... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论
Tip-and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas
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Nanomanufacturing and Metrology 2021年 第3期4卷 132-148页
作者: Ingo Ortlepp Thomas Frohlich Roland FuBl Johann Reger Christoph Schaffel Stefan Sinzinger Steffen Strehle ReneTheska Lena Zentner Jens-Peter Zollner Ivo WRangelow Carsten Reinhardt Tino Hausotte Xinrui Cao Oliver Dannberg Florian Fern david Fischer Stephan Gorges martin Hofmann Johannes Kirchner Andreas Meister Taras Sasiuk Ralf Schienbein Shraddha Supreeti Laura Mohr-Weidenfeller Christoph Weise Christoph Reuter Jaqueline Stauffenberg Eberhard Manske Institute of Process Measurement and Sensor Technology Technische Universitat IlmenauEhrenbergstrasse 2998693 IlmenauGermany Control Engineering Group Technische Universitat IlmenauIlmenauGermany Optical Engineering Group.Technische Universitat Ilmenau IlmenauGermany Microsystems Technology Group.Technische Universitat Ilmenau IlmenauGermany Precision Engineering Group.Technische Universitat Ilmenau IlmenauGermany Compliant Systems Group Technische Universitat IlmenauIlmenauGermany Micro-and Nanoelectronic Systems Group Technische Universitat IlmenauIlmenauGermany Nanoscale Systems Group.Technische Universitat Ilmenau IlmenauGermany Division for Research Service and Technology Transfer Technische Universitat IlmenauIlmenauGermany Electronics Technology Group.Technische Universitat Ilmenau IlmenauGermany IMMS Institut flir Mikroelektronik-und Mechatronik-Systeme Gemeinniitzige GmbH(IMMS GmbH) IlmenauGermany Fachgebiet Technische Physik City University of Applied SciencesBremenGermany Lehrstuhl fiir Fertigungsmesstechnik Friedrich-Alexander-U niversitat(FAU)Erlangen-NiirnbergGermany JUMO GmbH&Co.KG FuldaGermany Asphericon GmbH JenaGermany
The field of optical lithography is subject to intense research and has gained enormous ***,the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional *** effort and... 详细信息
来源: 维普期刊数据库 维普期刊数据库 评论