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CT影像标准化在影像组学分析中的重要性:非小细胞肺癌3年无复发生存率的预测研究

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国际医学放射学杂志 2023年第1期46卷 124-124页

作者： D.Park D.Oh M.H.lee s.y.lee K.M.shin J.s.G.Jun 秦丽莉

摘要目的对比分析标准化CT影像对非小细胞肺癌(NsCLC)病人3年无复发生存率(RFs)的预测效能是否优于非标准化CT影像。方法本研究共收集106例NsCLC病人

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碘对比剂的双相持续性过敏反应

国际医学放射学杂志 2018年第3期 365-365页

作者： T.H.Kim s.H.yoon s.y.lee y.H.Choi C.M.Park H.R.Kang 于清扬 Department of Radiology Seoul National University College of Medicine

摘要目的研究碘对比剂(ICM)双相持续性过敏反应的发生率、危险因素及双相反应的实际观测时间。方法 2005年1月—2016年2月间对145例ICM过敏反应病人进行回

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Cyclic stress-controlled tests on offshore clay

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Journal of Rock Mechanics and Geotechnical Engineering 2017年第2期9卷 376-381页

作者： s.y. Thian C.y. lee Department of Civil Engineering Jalan Ikram-UnitenUniversiti Tenaga NasionalKajang43000Malaysia

One of the main concerns in cyclic behavior of soft clay is gradual degradation with the progression of loading cycle.A series of cyclic constant-volume direct simple shear(CDss) loading tests was performed on Malaysia offshore clay to study its undrained *** testing program consists of stresscontrolled tests with cyclic shear ratio ranging from 0.34 to 0.83 at different overconsolidation ratios(OCRs).For a given cyclic stress ratio in stress-controlled tests,the accumulated cyclic strain and pore water pressure increase with elevated number of *** heavily overconsolidated clay specimens,the negative cyclic pore water pressure is generated followed by positive cyclic pore water pressure as cyclic tests *** post-cyclic strength of offshore clay specimens is reduced by undrained cyclic stresscontrolled loading.

关键词： Offshore clay Cyclic degradation Undrained cyclic loading shear strength Pore pressure Overconsolidation ratio(OCR)

Performance Analysis of Intelligent Robust Facility Layout Design

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Chinese Journal of Mechanical Engineering 2017年第2期30卷 407-418页

作者： G MOsLEMIPOUR T s lee y T LOONG Department of Industrial Engineering Payame Noor University Faculty of Engineering and Technology Multimedia University

Design of a robust production facility layout with minimum handling cost （MHC） presents an appropriate approach to tackle facility layout problems in a dynamic volatile environment, in which product demands randomly change in each planning period. The objective of the design is to find the robust facility layout with minimum total material handling cost over the entire multiperiod planning horizon. This paper proposes a new mathematical model for designing robust machine layout in the stochastic dynamic environment of manufacturing systems using quadratic assignment problem （QAP） formulation. In this investigation, product demands are assumed to be normally distributed random variables with known expected value, variance, and covariance that randomly change from period to period. The proposed model was verified and validated using randomly generated numerical data and benchmark examples. The effect of dependent product demands and varying interest rate on the total cost function of the proposed model has also been investigated. sensitivity analysis on the proposed model has been performed. Dynamic programming and simulated annealing optimization algorithms were used in solving the modeled example problems.

关键词： Robust layout Dynamic stochastic environment Manufacturing system Dynamic programming

胰腺导管腺癌（PDAC）伴局部淋巴结病灶进行标准淋巴结清扫术：MRI能否准确识别淋巴结阳性病人

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国际医学放射学杂志 2023年第6期 744-744页

作者： s.Adham M.Ferri s.y.lee N.Larocque O.A.Alwahbi L.Ruo 齐晓莹

摘要目的对于胰腺导管腺癌（PDAC）淋巴结标准清扫术后病理确认为阳性的局灶淋巴结，评估MRI定性、定量参数的诊断准确性。方法 2011—2021年期间，所有接受胰腺

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Tailoring Light–Matter Interactions in Overcoupled Resonator for Biomolecule Recognition and Detection

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Nano-Micro Letters 2025年第1期17卷 262-280页

作者： Dongxiao Li Hong Zhou Zhihao Ren Cheng Xu Chengkuo lee Department of Electrical and Computer Engineering National University of SingaporeSingapore 117583Singapore Center for Intelligent sensors and MEMs(CIsM) National University of SingaporeSingapore 117608Singapore

Plasmonic nanoantennas provide unique opportunities for precise control of light–matter coupling in surface-enhanced infrared absorption(sEIRA)spectroscopy,but most of the resonant systems realized so far suffer from the obstacles of low sensitivity,narrow bandwidth,and asymmetric Fano resonance ***,we demonstrated an overcoupled resonator with a high plasmon-molecule coupling coefficient(μ)(OC-Hμresonator)by precisely controlling the radiation loss channel,the resonator-oscillator coupling channel,and the frequency detuning *** observed a strong dependence of the sensing performance on the coupling state,and demonstrated that OC-Hμresonator has excellent sensing properties of ultra-sensitive(7.25%nm^(−1)),ultra-broadband(3–10μm),and immune asymmetric Fano *** characteristics represent a breakthrough in sEIRA technology and lay the foundation for specific recognition of biomolecules,trace detection,and protein secondary structure analysis using a single array(array size is 100×100μm^(2)).In addition,with the assistance of machine learning,mixture classification,concentration prediction and spectral reconstruction were achieved with the highest accuracy of 100%.Finally,we demonstrated the potential of OC-Hμresonator for sARs-CoV-2 *** findings will promote the wider application of sEIRA technology,while providing new ideas for other enhanced spectroscopy technologies,quantum photonics and studying light–matter interactions.

关键词： Plasmonic nanoantennas Light-matter interaction surface-enhanced infrared absorption Overcoupled Biosensing

Relation between etching profile and voltage-current shape of sintered siC etching by atmospheric pressure plasma

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Plasma science and Technology 2019年第4期21卷 137-144页

作者： D C sEOK s R yOO K I lee y s CHOI y H JUNG Plasma Technology Research Center National Fusion Research InstituteGunsan City 54004Republic of Korea

sintered silicon carbide(siC)was etched by a dielectric barrier discharge source.A high voltage bipolar pulse was used with helium gas for the plasma *** stable filament plasma was generated and could be used for siC *** the processing gas(NF3)mixing rate increased,the width and depth of the etching profile became narrower and *** differentiated V-Q Lissajous method was used for measuring the capacitances(Ceq)of the electrode after the plasma turned *** width of the etching profile was proportional to *** the current peak value/smx of the substrate current in creased,the volume removal rate of siC *** etch depth was proportional to the ratio of/smx to ***,because of the different characteristics of the plasma disks on siC substrate by the voltage polarity,the etching profile was ***,in high NF3 mixing process,the etching profile became stable and deeper.

关键词： dielectric barrier discharge silicon carbide plasma etching、filament discharge,surface charge