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Characterization of plastic flow in two Zr-based bulk metallic glasses

science China(Technological sci{2.) 2006年第4期49卷 414-424页

作者： xing dongmei1,2. zhang taihua1,{2.(LNM), institute of mechanics, chinese academy of sci- ences, beijing 100080, China 2. College of Physics and Electronic Information science, Tianjin Normal University, Tianjin 300074, China 3. National Microgravity laboratory, institute of mechanics, chinese academy of sci{12., beijing 100080, China 1. state key {2. of {2. mechanics (LNM) Institute of Mechanics Chinese Academy of Sciences Beijing 100080 China 2. College of Physics and Electronic Information science Tianjin Normal University Tianjin 300074 China 3. National Microgravity laboratory Institute of Mechanics Chinese Academy of Sciences Beijing 100080 China

Plastic deformation behaviors of Zr65Al10Ni10Cu15 and Zr52.5Al10Ni10Cu15Be12.5 bulk metallic glasses (BMGs) are studied by using the depth-sensing nanoindentation, microindentation and uniaxial compression. The Be-containing BMG exhibits a signifi- cantly improved overall plastic strain compared with the Be-free alloy during compressive tests. Both BMGs show a loading-rate-dependent serrated flow during nanoindentation measurements, but the Be-containing alloy exhibits a much lower critical loading rate for the disappearance of the serration than the Be-free BMG. The shear band patterns de- veloped during plastic deformation are investigated by microindentation technique, wherein much higher shear band density is found in the Be-containing alloy than in the Be-free alloy, indicating an easier nucleation of shear bands in the former BMG. The dif- ference in the plastic deformation behavior of the two BMGs can be explained by a free volume model.

关键词： Bulk metallic glass, plastic deformation, shear band, nanoindentation.

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Deformation behavior during nanoindentation in Ce-based bulk metallic glasses

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chinese science Bulletin 2006年第13期51卷 1639-1643页

作者： zhang lingchen xing {2. zhang taihua wei bingchen li weihuo WANG Yuren National Microgravity laboratory Institute of Mechanics Chinese Academy of Sciences Beijing 100080 China state key {2. of {2. mechanics (LNM) Institute of Mechanics Chinese Academy of Sciences Beijing 100080 China College of Physics and Electronic Information science Tianjin Norreal University Tianjin 300072 China

The deformation behavior and the ef- fect of the loading rate on the plastic deformation in Ce-based bulk metallic glasses (BMGs) were inves- tigated through nanoindentation tests. The results showed that the loading rate dependence of plastic deformation during nanoindentation measurements in the Ce-based BMGs is quite unique in contrast to that of other BMG alloys. The load-displacement (P-h) curves of Ce60Al15Cu10Ni15 BMG exhibit a homoge- neous plastic deformation at low loading rates, and a prominent serrated flow at high strain rates, whereas, the P-h curves of Ce65Al10Cu10Ni10Nb5 exhibit ho- mogenous plastic deformation at all studied loading rates. The room temperature creep behavior could clearly be observed in these two alloys. The mecha- nism of the unique plastic deformation feature in the Ce-based BMGs was studied.

关键词：大块金属玻璃纳米凹痕锯齿流蠕变

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Etch characteristics of Si_(1-x)Ge_x films in HNO_3:H_2.:HF

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science China(Technological sci{2.) 2011年第10期54卷 2802-2807页

作者： XUE ZhongYing wei xing liU linJie CHEN Da {2. Bo {2. Miao WANG Xi state key {2. of Functional Material for lnformatics Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China Graduate University of chinese academy of {2.{2. Beijing 100049 China Lanzhou University Lanzhou 730000 China

The etch characteristics of Si_1-xGex films in HNO3:H2.:HF were examined. The etch rate ratio (etch selectivity) between Si_1-xGex and Si escalated with the growth of HNO3 concentration at low concentration level, and when the HNO3 concentration exceeded a critical level the etch selectivity descended with higher HNO3 concentration. The dependence of etch selectivity on the HNO3 concentration was due to the higher critical HNO3 concentration for etching Si than that for etching Si1-xGex. Since the Ge-Ge bond energy was weaker than that of Si-Si and Si-Ge, the Ge atoms were oxidized preferentially once the HNO3 composition exceeded the critical concentration of etching Si1-xGex,which was manifested by the XPS spectra of Si1-xGex etched in HNO3:H2.:HF. When the HNO3 volume rose to another critical value, the significant growth of the Si etch rate low-ered the etch selectivity. Although both the etch rates of Si1-xGex and Si dropped with lower HF concentration, the etch rate ra-tio of Si1-xGex to Si boosted remarkably due to the water-soluble characteristics of GeO2.

关键词： Si_(1-x)Ge_x etch rate selectivity HNO_3 HF

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Erratum to： The effect of Bi composition on the electrical properties of InP1-xBix [sci. China-Phys. Mech. Astron. 60, 04702. (2.17)]

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science China(Physics,mechanics & Astronomy) 2018年第5期61卷 86-86页

作者： GuanNan wei xing Dai Qi Feng WenGang Luo YiYang li Kai Wang liYao {2. WenWu Pan ShuMin Wang ShenYuan Yang KaiYou Wang state key {2. of Superlattices and Microstructures Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China state key {2. of Semiconductor Materials science Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China state key {2. of Functional Materials for lnformatics Shanghai Institute of Microsystem and Information Technology Chinese Academy of Sciences Shanghai 200050 China

In the original publication [ 1 ] of this paper, the last supported grant number＂ 114742.7＂ should be ＂114742.4＂.G. N. wei, X. Dai, Q. Feng, W. G. Luo, Y. Y. li, K. Wang, L. Y. zhang, W. W. Pan, S. M. Wang, S. Y.... 详细信息

关键词：书写印刷性质平底锅 sci 奶

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超快光纤激光中的非线性脉冲放大技术(特邀)

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光子学报 2022年第7期51卷 309-326页

作者：陈润植邢宇婷张瑶王栋梁王军利魏志义常国庆中国科学院物理研究所光物理重点实验室北京100190 西安电子科技大学物理与光电工程学院西安710071 中国科学院大学北京100049 松山湖材料实验室广东东莞523808

高功率高能量飞秒光纤激光系统通常采用主振荡器加功率放大器结构。在放大飞秒脉冲时,非线性效应是制约脉冲能量的主要因素。基于传统啁啾脉冲放大技术的光纤激光系统虽然能够产生能量在1 mJ量级的飞秒脉冲,但是所产生的脉冲通常在2.0 f... 详细信息

高功率高能量飞秒光纤激光系统通常采用主振荡器加功率放大器结构。在放大飞秒脉冲时,非线性效应是制约脉冲能量的主要因素。基于传统啁啾脉冲放大技术的光纤激光系统虽然能够产生能量在1 mJ量级的飞秒脉冲,但是所产生的脉冲通常在2.0 fs以上,无法直接满足能量要求较低(1~100μJ范围之内)、脉冲宽度却更短(60 fs以下甚至更短)的应用需求。与啁啾脉冲放大技术通过展宽脉冲而减少非线性相移相反,非线性放大故意保持脉冲的宽度在皮秒量级从而积累大量的非线性相移,导致放大后脉冲的光谱展宽为输入光谱的数倍,经过传统光栅对压缩后能够产生60 fs以下的近变换极限脉冲。本文主要以掺镱光纤放大系统为例,重点介绍自相似抛物线脉冲放大、预啁啾管理放大、增益管理放大和非线性分脉冲放大四种非线性光纤放大技术的工作原理、发展现状以及未来趋势。将提出的预啁啾管理分脉冲放大与多路相干合成相结合,有望产生重复频率1 MHz、平均功率超过1 kW、脉冲能量1 mJ左右的亚50 fs脉冲。这种千瓦级高重复频率、高能量飞秒脉冲源在基础科学、激光加工等领域中具有潜在的应用。

关键词：超快光纤激光自相似抛物线脉冲放大预啁啾管理放大增益管理放大预啁啾分脉冲放大

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