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Numerical study on discharge characteristics influenced by secondary electron emission in capacitive RF argon glow discharges by fluid modeling

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Chinese Physics B 2018年第2期27卷 415-422页

作者：赵璐璐刘悦 tagra samir Key Laboratory of Materials Modification by Laser Ion and Electron Beams (Ministry of Education) School of PhysicsDalian University of Technology School of Information Science and Engineering Dalian Polytechnic University

A one-dimensional（1D） fluid model of capacitive RF argon glow discharges between two parallel-plate electrodes at low pressure is employed. The influence of the secondary electron emission on the plasma characteristics in the discharges is investigated numerically by the model. The results show that as the secondary electron emission coefficient increases,the cycle-averaged electric field has almost no change; the cycle-averaged electron temperature in the bulk plasma almost does not change, but it increases in the two sheath regions; the cycle-averaged ionization rate, electron density, electron current density, ion current density, and total current density all increase. Also, the cycle-averaged secondary electron fluxes on the surfaces of the electrodes increase as the secondary electron emission coefficient increases. The evolutions of the electron flux, the secondary electron flux and the ion flux on the powered electrode increase as the secondary electron emission coefficient increases. The cycle-averaged electron pressure heating, electron Ohmic heating, electron heating, and ion heating in the two sheath regions increase as the secondary electron emission coefficient increases. The cycle-averaged electron energy loss increases with increasing secondary electron emission coefficient.

关键词： RF glow discharge secondary electron emission fluid model

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Effects of gas pressure on plasma characteristics in dual frequency argon capacitive glow discharges at low pressure by a self-consistent fluid model

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Chinese Physics B 2017年第12期26卷 361-370页

A self-consistent fluid model for dual radio frequency argon capacitive glow discharges at low pressure is established. Numerical results are obtained by using a finite difference method to solve the model numerically, and the results are analyzed to study the effect of gas pressure on the plasma characteristics. It shows that when the gas pressure increases from 0.3 Torr （1 Torr=1.33322102 Pa） to 1.5 Torr, the cycle-averaged plasma density and the ionization rate increase; the cycle-averaged ion current densities and ion energy densities on the electrodes electrode increase; the cycle-averaged electron temperature decreases. Also, the instantaneous electron density in the powered sheath region is presented and discussed. The cycle-averaged electric field has a complex behavior with the increasing of gas pressure, and its changes take place mainly in the two sheath regions. The cycle-averaged electron pressure heating, electron ohmic heating, electron heating, and electron energy loss are all influenced by the gas pressure. Two peaks of the electron heating appear in the sheath regions and the two peaks become larger and move to electrodes as the gas pressure increases.

关键词： dual frequency gas pressure glow discharge

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Effect of driving frequency on electron heating in capacitively coupled RF argon glow discharges at low pressure

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Chinese Physics B 2017年第11期26卷 329-337页

作者： tagra samir 刘悦赵璐璐周艳文 Key Laboratory of Materials Modification by Laser Ion and Electron Beams Ministry of Education School of PhysicsDalian University of Technology School of Information Science and Engineering Dalian Polytechnic University School of Materials & Metallurgy University of Science & Technology

A one-dimensional（1D） fluid model on capacitively coupled radio frequency（RF） argon glow discharge between parallel-plates electrodes at low pressure is established to test the effect of the driving frequency on electron heating. The model is solved numerically by a finite difference method. The numerical results show that the discharge process may be divided into three stages： the growing rapidly stage, the growing slowly stage, and the steady stage. In the steady stage,the maximal electron density increases as the driving frequency increases. The results show that the discharge region has three parts： the powered electrode sheath region, the bulk plasma region and the grounded electrode sheath region. In the growing rapidly stage（at 18 μs）, the results of the cycle-averaged electric field, electron temperature, electron density, and electric potentials for the driving frequencies of 3.39, 6.78, 13.56, and 27.12 MHz are compared, respectively. Furthermore,the results of cycle-averaged electron pressure cooling, electron ohmic heating, electron heating, and electron energy loss for the driving frequencies of 3.39, 6.78, 13.56, and 27.12 MHz are discussed, respectively. It is also found that the effect of the cycle-averaged electron pressure cooling on the electrons is to ＂cool＂ the electrons; the effect of the electron ohmic heating on the electrons is always to ＂heat＂ the electrons; the effect of the cycle-averaged electron ohmic heating on the electrons is stronger than the effect of the cycle-averaged electron pressure cooling on the electrons in the discharge region except in the regions near the electrodes. Therefore, the effect of the cycle-averaged electron heating on the electrons is to ＂heat＂ the electrons in the discharge region except in the regions near the electrodes. However, in the regions near the electrodes, the effect of the cycle-averaged electron heating on the electron is to ＂cool＂ the electrons. Finally, the space distributions of the electron

关键词： capacitively coupled plasmas electron heating radio frequency(RF) glow discharges driving frequency

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低气压射频和脉冲射频氩气放电等离子体的比较

低气压射频和脉冲射频氩气放电等离子体的比较

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第十六届全国等离子体科学技术会议暨第一届全国等离子体医学研讨会

作者：刘睿强刘悦 tagra samir 刘倩张向东大连理工大学三束材料改性教育部重点实验室重庆电子工程职业学院

引言低气压射频放电因其可以产生大面积等离子体,装置简单,容易控制,己广泛地应用于薄膜沉积、等离子体刻蚀和材料表面改性等许多领域。为了提高应用效率,人们对其进行了深入细致的研究。相比于连续射频放电,低气压脉冲射频等离子体可...

引言低气压射频放电因其可以产生大面积等离子体,装置简单,容易控制,己广泛地应用于薄膜沉积、等离子体刻蚀和材料表面改性等许多领域。为了提高应用效率,人们对其进行了深入细致的研究。相比于连续射频放电,低气压脉冲射频等离子体可以增加参加反应物种的选择比,提高刻蚀均匀性,减小刻蚀和沉积速率,减小对基片的损伤,减小基片的热量,节约能源。由于低气压脉冲放电有诸多优点,已经吸引了许

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