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RAIN INTENSITY DISTRIBUTION IN THE SPLASH REGION OF ATOMIZED FLOW

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Journal of Hydrodynamics 2006年第3期18卷 362-366页

作者： DUAN Hong-dong LIU shi-he LUO qiu-shi huang Wei School of Water Resource and Hydropower Wuhan University Wuhan 430072China Water Resources and Hydropower Planning and Design General Institute MWR Beijing 100011 China

Atomized flow is an unnatural two-phase flow produced while water discharges in water release structures. This flow might threaten the normal operation of hydraulic and hydroelectric installations owing to the unnatural and high-density rain as well as the unnatural and dirty mist. The splash region, the region with the highest rain intensity, hence should receive much attention during the design and operation of the hydraulic and hydroelectric installations. In this paper rain intensity distribution in the splash region of the atomized flow is investigated experimentally, and the method of random simulation is used to predict the rain intensity distribution in the splash region.

关键词： atomized flow splash rain intensity

Effects of sputtering power and annealing temperature on surface roughness of gold films for high-reflectivity synchrotron radiation mirrors

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Nuclear Science and Techniques 2019年第7期30卷 36-41页

作者： Jia-Qi Chen qiu-shi huang Run-Ze Qi Yu-Fei Feng Jiang-Tao Feng Zhong Zhang Wen-Bin Li Zhan-Shan Wang MOE Key Laboratory of Advanced Micro-Structured Materials Institute of Precision Optical Engineering (IPOE)School of Physics Science and Engineering Tongji University

Gold films deposited by direct current magnetron sputtering are used for synchrotron radiation optics. In this study, the microstructure and surface roughness of gold films were investigated for the purpose of developing high-reflectivity mirrors. The deposition process was first optimized. Films were fabricated at different sputtering powers (15, 40, 80, and 120 W) and characterized using grazing incidence X-ray reflectometry, X-ray diffraction, and atomic force microscopy. The results showed that all the films were highly textured, having a dominant Au (111) orientation, and the film deposited at 80 W had the lowest surface roughness. Subsequently, post-deposition annealing from 100 to 200℃ in a vacuum was performed on the films deposited at 80 W to investigate the effect of annealing on the microstructure and surface roughness of the films. The grain size, surface roughness, and their relationship were investigated as a function of annealing temperature. AFM and XRD results revealed that at annealing temperatures of 175 ℃ and below, microstructural change of the films was mainly manifested by the elimination of voids. At annealing temperatures higher than 175℃, grain coalescence occurred in addition to the void elimination, causing the surface roughness to increase.

关键词： Gold films Sputtering power Annealing Microstructure Roughness

Stress, Roughness and Reflectivity Properties of Sputter-Deposited B4C Coatings for X-Ray Mirrors

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Chinese Physics Letters 2019年第12期36卷 17-21页

作者： Jia-Li Wu Run-Ze Qi qiu-shi huang Yu-Fei Feng Zhan-Shan Wang Zi-Hua Xin Department of Physics Shanghai UniversityShanghai 200444 MOE Key Laboratory of Advanced Micro-Structured Materials Shanghai 200092 Institute of Precision Optical Engineering School of Physics Science and EngineeringTongji UniversityShanghai 200092

Boron carbide(B4C)coatings have high reflectivity and are widely used as mirrors for free-electron lasers in the x-ray ***,B4C coatings fabricated by direct-current magnetron sputtering show a strong compressive stress of about-3 *** changing the argon gas pressure and nitrogen-argon gas mixing ratio,we are able to reduce the intrinsic stress to less than-1 GPa for a 50-nm-thick B4C *** is found that the stress in a coating deposited at 10 m Torr is-0.69 GPa,the rms roughness of the coating surface is 0.53 nm,and the coating reflectivity is 88%,which is lower than those of coatings produced at lower working *** the working gas contains 8%nitrogen and 92%argon,the B4 C coating shows not only-1.19 GPa stress but also a low rms roughness of 0.16 nm,and the measured reflectivity is 93%at the wavelength of 0.154 nm.

关键词： coating stress carbide

The development of laser-produced plasma EUV light source

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Chip 2022年第3期1卷 50-60页

作者： De-Kun Yang Du Wang qiu-shi huang Yi Song Jian Wu Wen-Xue Li Zhan-Shan Wang Xia-Hui Tang Hong-Xing Xu Sheng Liu Cheng-Qun Gui The Institute of Technological Sciences Wuhan UniversityWuhan 430072China Key Laboratory of Advanced Micro-Structured Materials MOE Institute of Precision Optical EngineeringSchool of Physics Science and EngineeringTongji UniversityShanghai 200092China State Key Laboratory of Precision Spectroscopy East China Normal UniversityShanghai 200241China School of Optical and Electronic Information Huazhong University of Science and TechnologyWuhan 430074China School of Physics and Technology Wuhan UniversityWuhan 430072China

Extreme ultraviolet lithography(EUVL)has been demonstrated to meet the industrial requirements of new-generation semiconductor *** development of high-power EUV sources is a long-term critical challenge to the implementation of EUVL in high-volume manufacturing(HVM),together with other technologies such as photoresist and ***,both theoretical studies and experiments have clearly indicated that the CO 2 laser-produced plasma(LPP)system is a promising solution for EUVL source,able to realize high conversion efficiency(CE)and output ***,ASML’s NXE:3400B EUV scanner configuring CO_(2) LPP source sys-tem has been installed and operated at chipmaker ***-while,other research teams have made different progresses in the development of LPP EUV ***,in their technologies,some critical areas need to be further improved to meet the requirements of 5 nm node and *** needed improvements include higher laser power,stable droplet generation system and longer collector *** this paper,we describe the performance characteristics of the laser system,droplet generator and mirror collector for different EUV sources,and also the new development results.

关键词： Extreme ultraviolet source Laser-produced plasma Sn target Long lifetime collector

Calibration of X-ray telescope prototypes at PANTER

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Research in Astronomy and Astrophysics 2019年第12期19卷 199-206页

作者： Ying-Yu Liao Zheng-Xiang Shen Jun Yu qiu-shi huang Bin Ma Zhong Zhang Xiao-Qiang Wang Kun Wang Chun Xie Vadim Burwitz Gisela Hartner Marlis-Madeleine La Caria Carlo Pelliciari Zhan-Shan Wang Key Laboratory of Advanced Micro-Structured Materials Ministry of EducationTongji UniversityShanghai 200092China Institute of Precision Optical Engineering School of Physics Science and EngineeringTongji UniversityShanghai 200092China School of Mechanical Engineering Tongji UniversityShanghai 200092China Sino-German College of Applied Sciences Tongji UniversityShanghai 200092China Max-Planck-Institute for Extraterrestrial Physics Giessenbachstr85748 GarchingGermany

We report on a ground X-ray calibration of two X-ray telescope prototypes at the PANTER X-ray Test Facility, operated by the Max-Planck-Institute for Extraterrestrial Physics, in Neuried, *** X-ray telescope prototypes were developed by the Institute of Precision Optical Engineering(IPOE)of Tongji University, in a conical Wolter-I configuration, using thermal glass slumping *** #1 with three layers and Prototype #2 with 21 layers were tested to assess the prototypes’ onaxis imaging performance. The measurement of Prototype #1 indicates a Half Power Diameter(HPD) of 82′′ at 1.49 keV. As for Prototype #2, we performed more comprehensive measurements of on-axis angular resolution and effective area at several energies ranging from 0.5–10 keV. The HPD and effective area are111′′ and 39 cm^2 at 1.49 keV, respectively, at which energy the on-axis performance of the prototypes is our greatest concern.

关键词： X-ray telescopes thermal slumping technology X-ray calibration PANTER

Time-resolved ultra-small-angle X-ray scattering beamline(BL10U1)at SSRF

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Nuclear Science and Techniques 2024年第2期35卷 6-19页

作者： Wen-Qiang Hua Chun-Ming Yang Ping Zhou Feng Tian Jin-You Lin Yu-Zhu Wang Xiao-Yun Li Xia-Ran Miao Chun-Xia Hong qiu-shi huang Xin-Tong Zhao Yong-Feng Men Jie Wang Xing-Yu Gao Xiu-Hong Li Shanghai Synchrotron Radiation Facility Shanghai Advanced Research InstituteChinese Academy of SciencesShanghai 201204China Key Laboratory of Advanced Micro Structural Materials MOEInstitute of Precision Optical EngineeringSchool of Physics Science and EngineeringTongji UniversityShanghai 200092China State Key Laboratory of Polymer Physics and Chemistry Changchun Institute of Applied ChemistryChinese Academy of SciencesChangchun 130022China

The construction of a new beamline,BL10U1,was completed at the Shanghai synchrotron radiation facility in *** multipurpose beamline was designed to provide X-ray scattering techniques such as ultra-small-angle X-ray scattering(USAXS),small-angle X-ray scattering(SAXS),wide-angle X-ray scattering,and microfocus SAXS(μSAXS)for a broad user *** realize fast time-resolved USAXS experiments,the beamline adopted an in-vacuum undulator with a total length of 1.6 m as the photon *** in-house cryogenic-cooled double multilayer monochromator was installed to deliver a photon flux of approximately 10^(13) photons/s at a photon energy of 10 *** three-year successful operation of this beamline demonstrated that the monochromator operated smoothly,as ***10U1 has three end stations in succession:USAXS end station,μSAXS end station,and end station for industrial *** minimum scattering vector q~0.0042 nm^(-1) at 10 keV can be achieved at the USAXS end station equipped with a 28 m-long and 1.8 m-diameter vacuum flight *** theμSAXS end station,a beam spot of less than 10×8μm was achieved for micro-SAXS *** contrast,in situ experimental instruments up to 5 m high and 8 m wide can be mounted at the industrial application end station,which offers industrial scientists the opportunity to use their large industrial ***10U1 opens up a new capability to investigate phenomena such as non-equilibrium and dynamic processes of materials with a wide length scale from angstroms to micrometers with millisecond time *** this paper,we also report beamline design considerations and commissioning results.

关键词： Synchrotron radiation Ultra-small-angle X-ray scattering Micro small-angle X-ray scattering USAXS Time resolved μSAXS

以SiF_4+H_2为气源PECVD法低温制备多晶硅薄膜

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太阳能学报 2004年第3期25卷 333-336页

作者：邱春文石旺舟黄翀汕头大学物理系汕头515063

采用常规的PECVD法在低温(≤400℃)条件下制得大颗粒(直径>100nm)、高迁移率(～20cm2/vs),择优取向(220)明显的多晶硅薄膜。选用的反应气体为SiH4和H2混合气体。加入少量的SiH4后,沉积速率提高了将近10倍。通过本实验,我们认为在低温时... 详细信息

采用常规的PECVD法在低温(≤400℃)条件下制得大颗粒(直径>100nm)、高迁移率(～20cm2/vs),择优取向(220)明显的多晶硅薄膜。选用的反应气体为SiH4和H2混合气体。加入少量的SiH4后,沉积速率提高了将近10倍。通过本实验,我们认为在低温时促使多晶硅结构形成的反应基元应是SiFmHn(m+n≤3),而不可能是SiHn(n≤3)基团。

关键词：多晶硅薄膜瞰 Ⅷ法低温制备

Protein-protein interaction map is a key gateway into liver regeneration

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World Journal of Gastroenterology 2010年第28期16卷 3491-3498页

作者： Chao Xie Run-Zhi Zhu Yun-Sheng Yuan Hong-Lin He Yan Yu Chao Xie qiu-shi huang Jin Gao Wei Han School of Agriculture and Biology Shanghai Municipality Key Laboratory of Veterinary Biotechnology Shanghai Jiao Tong University Shanghai 200240 China Department of Food Science Cornell University Ithaca NY 14853 United States Laboratory of Regeneromics School of Pharmacy Shanghai Jiao Tong UniversityShanghai 200240 China

Recent studies indicate that the process of liver regeneration involves multiple signaling pathways and a variety of genes,cytokines and growth factors. Protein-protein interactions(PPIs)play a role in nearly all events that take place within the cell and PPI maps should be helpful in further understanding the process of liver *** this review,we discuss recent progress in understanding the PPIs that occur during liver regeneration especially those in the transforming growth factorβsignaling *** believe the use of large-scale PPI maps for integrating the information already known about the liver regeneration is a useful approach in understanding liver regeneration from the standpoint of systems biology.

关键词： Liver regeneration Protein-protein interaction Protein-protein interaction maps Transforming growth factorβ

Investigation of natural contamination layer growth on optical substrates

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Chinese Physics C 2018年第11期42卷 107-119页

作者： Li Jiang qiu-shi huang Igor V.Kozhevnikov Yi-Yun Yao Jiang-Tao Feng Yu-Fei Feng Bin Ma Hong-Fei Jiao Hong Chen Zhong Zhang Zhan-Shan Wang Key Laboratory of Advanced Micro-Structured Materials MOE Institute of Precision Optical Engineering School of Physics Science and Engineering Tongji University Shanghai 200092 China Shubnikov Institute of Crystallography of Federal Scientific Research Centre "Crystallography and Photonics" of the Russian Academy of Sciences Leninskiy pr. 59 Moscow 119333 Russia

The surface contamination layer on mirrors can cause significant degradation of the optical performance, which is widely observed in applications, particularly in the fabrication of X-ray focusing telescopes. In this paper, we study the natural contamination layer arising from adsorption precipitation of hydrocarbons or other organic and water molecules in the absence of any external factor. Temporal evolution of the layer formed on super-smooth fused silica, borosilicate glass, and silicon substrates is studied by X-ray reflectometry, atomic force microscopy, and transmission electron microscopy for a one-year period after surface cleaning. The general characteristics of adhesion layer growth are established and discussed. The reconstructed dielectric constant profiles demonstrate that an increase in the adhesion layer thickness, deposited mass and density over time obeys power laws with extremely small exponents. Therefore, the adhesion layer growth is rapid immediately after surface cleaning, with a - 1 nm thick layer formed within the first day on all three substrates studied, while the layer density is low （- 1 g/cm^3）. The layer growth on the fused silica and silicon substrates became very slow in the succeeding days, with only a 1.4-1.5 nm thick layer and 1.2-1.3 g/cm^3 density after one year of storage in air. At the same time, the adhesion layer growth on the glass substrate showed unexpected acceleration about two months after cleaning, so that the layer thickness reached - 2.2 nm after one year of storage. The reason for this effect, which is connected with leaching of the glass, is discussed briefly.

关键词： X-ray telescope surface contamination surface dynamics X-ray reflectometry inverse problem