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3D printing of optical materials by processes based on photopolymerization:materials,technologies,and recent advances

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Photonics Research 2022年第6期10卷 1344-1360页

作者： EMMA GEISLER MAXIME LECOMPèRE olivier soppera Universitéde Haute-Alsace CNRSIS2M UMR 7361F-68100 MulhouseFrance Universitéde Strasbourg F-67000 StrasbourgFrance Essilor International 94000 CréteilFrance

3D printing technologies have expanded beyond the research laboratories where they were used solely for prototyping and have become widely used in several industries.The production of custom 3D objects has significant potential in optical applications.However,this necessitates extremely specific material properties,such as transparency,homogeneity,birefringence,and surface finish.Currently,the majority of optical objects are manufactured using plastics.Moreover,the 3D printing processes using polymers to produce optical objects have significant advantages,such as limited wastage,short manufacturing time,and easy customization.However,despite extensive efforts,no technology has achieved the production of objects perfectly suited for optical applications.The objective of this review is to summarize recent advances in the field of 3D printing for optics,with an emphasis on specific developments for dedicated applications,and to explore new candidate processes.

关键词： printing expanded transparency

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Optically controlled magnetic-field etching on the nano-scale

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Light(Science & Applications) 2016年第1期5卷 522-528页

作者： Takashi Yatsui Toshiki Tsuboi Maiku Yamaguchi Katsuyuki Nobusada Satoshi Tojo Fabrice Stehlin olivier soppera Daniel Bloch School of Engineering University of TokyoBunkyo-kuTokyo113-8656 Japan Department of Theoretical and Computational Molecular Science Institute for Molecular ScienceMyodaijiOkazaki444-8585 Japan Faculty of Science and Engineering Chuo UniversityBunkyo-kuTokyo112-8551 Japan Institut de Sciences des Materiaux de Mulhouse(IS2M) CNRSUMR7361Universite´de Haute-Alsace15rue Jean StarckyBP2488Mulhouse Cedex 68057France Laboratoire de Physique des Lasers UMR 7538 du CNRSUniversite´Paris13-Sorbonne-Paris-Cite´F-93430 VilletaneuseFrance

Electric and magnetic fields play an important role in both chemical and physical reactions.However,since the coupling efficiency between magnetic fields and electrons is low in comparison with that between electric fields and electrons in the visible wavelength region,the magnetic field is negligible in photo-induced reactions.Here,we performed photo-etching of ZrO_(2) nano-stripe structures,and identified an etching-property polarisation dependence.Specifically,the etching rate and etched profiles depend on the structure width.To evaluate this polarisation-dependent etching,we performed numerical calculations using a finite-difference time-domain method.Remarkably,the numerical results revealed that the polarisation-dependent etching properties were determined by the magnetic field distributions,rather than the electric field distributions.As nano-scale structures induce a localised magnetic field,the discovery of this etching dependence on the magnetic field is expected to introduce a new perspective on advanced nano-scale structure fabrication.

关键词： nano-scale near-field etching optically controlled magnetic-field interaction

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