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Do.o.itizatio. in Campanian o.l Shale Ro.ks fro. So.th-Western Jo.dan

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o.en Jo.rnal o. Geo.o.y 2015年第10期5卷 689-700页

作者： Hani M. Alnawafleh Khalid E. tarawneh Hani N. Kho.ry Nafeth A. Abdelhadi o.ama Y. Shakko.ry Reyad A. Dwairi Mazen N. Amaireh Faculty o. Engineering Al-Hussein Bin Talal University Ma’an Jordan Faculty o. Engineering Isra University Amman Jordan Department o. Geo.o.y The University of Jordan Amman Jordan Faculty o. Engineering Techno.o.y Al Balqa Applied University Salt Jordan Natural Reso.rces Autho.ity Amman Jordan Faculty o. Engineering Tafila Technical University Tafila Jordan

This wo.k represents the first detailed study o. an o.l shale (o.) sectio. fro. the Upper Campanian Amman Silicified Limesto.e (ASL) Fo.matio. in so.th-western part o. Jo.dan. Mo.e than five meters o. o.l shale have been reco.ded. Using the petro.raphy and geo.hemistry, this study aims to.fo.us o. such no.-co.ventio.al types o. o.l shale ro.ks in Jo.dan and to.shed so.e light o. their co.po.itio. and fo.matio.al enviro.ment. Unlike o.l shale fro. Maastrichtian to.early Tertiary, this type o. o.l shale is highly do.o.itized. The do.o.ite is diagenetic in o.igin. This o.l shale type co.tains co.siderable amo.nt o. o. and remarkably enriched in so.e trace elements and sho.s quite lo. sulfur co.tent. Results suggest that the fo.matio. o. do.o.ite appears to.be limited by the rate o. o.ganic matter o.idatio..

关键词： Jo.dan o.l Shale Do.o.itizatio. Campanian

Impro.ing the o.f-chip Bandwidth Utilizatio. o. Chip-Multipro.esso.s Using Early Write-Back

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通讯和计算机（中英文版） 2013年第1期10卷 33-41页

作者： Mutaz A1-tarawneh NazeihBo.ro. Department o. Electrical and Co.puter Engineering Southern Illinois University Carbondale Carbondale 62901 USA

In this paper, the autho.s investigate the early write-back technique fo. two.level cache hierarchy in a CMP (chip-multipro.esso.) with fo.r pro.esso. co.es. This technique will issue an early write-back, fro. the shared L2 (seco.d-level) cache to.the main memo.y fo. so.e dead and dirty cache lines prio. to.their evictio.. The early write-back will be issued when the o.f-chip bus is free. This technique wo.ld impro.e the perfo.mance o. the pro.esso. by avo.ding o. minimizing the o.f-chip bus co.tentio. between write-back o.eratio.s and demand fetches. Early write-back impro.es the Bus-Time (i. e., the time an o.f-chip access spends using the o.f-chip bus) o. tho.e demand fetches including read and write misses in the shared L2 cache. Co.pared to.the co.ventio.al write-back strategy, the use o. early write-back has impro.ed o.f-chip bandwidth utilizatio.. Early write-back has achieved varying degrees o. impro.ement amo.g different benchmarks.

关键词：带宽利用率多处理器早期芯片二级高速缓存需求获取层次结构主存储器

I Do.Bio.ech Dental Implants: Pro.pective Multicentric Study after 5 Years o. Functio.al Lo.ding

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o.en Jo.rnal o. Sto.ato.o.y 2020年第6期10卷 121-139页

作者： J. F. Ballester Ferrandis So.g Jae Hyun Kim Jo.g Yeo. Anaraki Mo.aammad Varun Go.l Shaker tarawneh Ming Yang De Darabi Mo.ammadreza Ysang Century Tian Han Qing S. J. Ballester Bo. Po.tgraduate Implanto.o.y Pro.ram at UFP-ESo.IB Madrid Spain

Intro.uctio.: I Do.Bio.ech’s implants were develo.ed starting in 2014. Since then, they o.tained GMP and KFDA licenses fo. distributio. in 2015. The main o.jective o. this paper is to.determine the survival rate o. I... 详细信息

Introduction: I Do Biotech’s implants were developed starting in 2014. Since then, they obtained GMP and KFDA licenses for distribution in 2015. The main objective of this paper is to determine the survival rate of I Do Biotech implants five years after the first surgery. Material and Methods: 1000 implants were used on 480 prostheses across 10 clinics on 320 healthy, non-smoker and non-diabetic patients, chosen at random, of which 160 are male and 160 female, all in the age range of 30 to 50 years old. The failure rate was studied related to the patient’s gender, the length and diameter of the implant, anatomical location, the percentage of peri-implantitis, prosthodontic failures and the patient’s quality of life. Discussion: The results obtained are similar to those of Van Steenberghe D. Dieter-Busenlechner, E. Serrano Catauria and far superior to those of Sáenz Guzmán. Failure rates vary greatly from study to study due to the heterogeneity of the samples in the other research papers. Conclusion: The overall implant failure rate at 5 years is 1.7%. The factors affecting significantly the survival rate are: the implant diameter, its length and the anatomic area. Failure ratios increase significantly when the diameter or the length of the implant decreases, and when they are placed in the posterior maxilla (up to 4.3%).o.t-family:Verdana;">

关键词： Dental Implants Titanium Mo.se Taper SLA Surface Multicentric Study Peri-Implantitis Pro.tho.o.tic Failures Study after 5 Years o. Lo.ding Quality o. Life

Adaptable Mo.el fo. Assessing the Quality o. E-Co.merce Systems

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通讯和计算机（中英文版） 2012年第1期9卷 65-72页

作者： Hind Al-Husban Manar Maraqa Haro.0} Albalqa Apllied University SaltJordan

Web Applicatio.s Develo.ment and So.tware Pro.ess Impro.ement in Small So.tware Firms： A Review

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通讯和计算机（中英文版） 2011年第1期8卷 58-62页

作者： Mo.amad M. Al-Laham Haro.0} Ammar K. Al-Masri MIS Department Al-Balqa Applied University Amman 00962 Jordan