The photosensitivity of silicon is inherently very low in the visible electromagnetic spectrum,and it drops rapidly beyond 800 nm in near-infrared *** have experimentally demonstrated a technique utilizing photon-trap...
详细信息
The photosensitivity of silicon is inherently very low in the visible electromagnetic spectrum,and it drops rapidly beyond 800 nm in near-infrared *** have experimentally demonstrated a technique utilizing photon-trapping surface structures to show a prodigious improvement of photoabsorption in 1-μm-thin silicon,surpassing the inherent absorption efficiency of gallium arsenide for a broad *** photon-trapping structures allow the bending of normally incident light by almost 90 deg to transform into laterally propagating modes along the silicon ***,the propagation length of light increases,contributing to more than one order of magnitude improvement in absorption efficiency in *** high-absorption phenomenon is explained by finitedifference time-domain analysis,where we show an enhanced photon density of states while substantially reducing the optical group velocity of light compared to silicon without photon-trapping structures,leading to significantly enhanced light–matter *** simulations also predict an enhanced absorption efficiency of photodetectors designed using 30-and 100-nm silicon thin films that are compatible with CmOS *** a very thin absorption layer,such photon-trapping structures can enable high-efficiency and high-speed photodetectors needed in ultrafast computer networks,data communication,and imaging systems,with the potential to revolutionize on-chip logic and optoelectronic integration.
暂无评论