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The influence of the nonmagnetic metal spacer Bi,Ag and Cu on the properties of the multilayer films

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Chinese Science Bulletin 2006年第18期51卷 2183-2188页

作者： LI Minghua YU Guanghua ZHU Fengwu lai wuyan College of Mechanical Engineering. South China University of Technology Guangzhou 510640 China Department of Materials Physics University of Science and Technology Beijing Beijing 100083 China Institute of Physics Chinese Academy China

Ta/NiFe/Bi(Ag, Cu)/FeMn/Ta and Ta/ NiFeⅠ /FeMn/Bi(Ag, Cu)/NiFeⅡ/Ta films were prepared by magnetic sputtering. The texture of films was examined by X-ray diffraction (XRD). The depend-ence of the Hex1 between NiFeⅠ/FeMn films and the Hex2 between FeMn/NiFeⅡ on the Bi, Ag and Cu thickness was studied in Ta/NiFeⅠ/FeMn/Bi(Ag, Cu)/ NiFeⅡ/Ta. The experimental results show that the He1 ranged from 130 to 140 Oe with an increase in the nonmagnetic metal spacer thickness. The Hex2 de-creased dramatically and became flat finally with the increase of the Bi, Ag and Cu thickness. XPS results show that Bi, Ag and Cu atoms do not stay entirely at the interface of FeMn/NiFeⅡ film; they are at least partly segregated to the surface of NiFe film. The more Bi, Ag and Cu atoms are deposited, the more they are segregated at the NiFe layer.

关键词： NiFe/FeMn 无磁性垫片交换耦合晶格匹配表面偏析多层膜

Relationship between giant magnetoresistance of NiFe/Cu multilayers and their microstructures

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Chinese Science Bulletin 1998年第15期43卷 1268-1271页

作者： Hongwei Jiang Guangming Luo Zhenhong Mai wuyan lai Chinese Acad Sci Inst Phys State Key Lab Magnetism Beijing 100080 Peoples R China

The (111)_orientated NiFe/Cu multilayers were prepared by magnetron sputtering method. At room temperature, saturation magnetoresistances of NiFe/CU multilayers oscillate as a function of Cu spacer layer thickness. Two peak GMR values of 19 4%, 11 6% and 11 2%, 1% appear, respectively, at Cu sublayer thickness of t Cu =1 0, 2 2 nm while the deposition pressures are 0 25 and 0 45 Pa. X_ray small_angle reflections and diffuse scattering at Cu K_edge (8 979 keV) by synchrotron radiation source were used to characterize the interfacial roughness. Diffraction anomalous fine_structure scattering (DAFS) was performed to investigate the local structure of NiFe and Cu sublayers. Results show that the deposition pressure has effect on interfacial roughness of the samples obviously, and the interfacial roughness also affects the GMR values of the samples strongly.

关键词： multilayer GMR synchrotron radiation interface roughness.

Giant Magnetoresistance of Fe/Ag Multilayer Films with Ultrathin Fe Layers

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Chinese Physics Letters 1994年第12期11卷 775-777页

作者： LI Shuxiang YU Chengtao YAN Minglang lai wuyan WANG Yizhong State Key Laboratory for Magnetism Institute of PhysicsAcademia SinicaBeijing 100080

A giant magnetoresistive effect in as-deposited Fe/Ag multilayer films with ultrathin Fe layers has been *** magnetoresistance in this system is presented first as a function of Fe layer thickness *** sample with Fe layer thickness of 4Åexhibits a magnetoresistance ratio as large as 14.3%at *** magnetoresistance ratio decreases approximately an order of magnitude with increasing tFe from 4 to 10Åand then changes slightly with further increasing *** the hysteresis loop measurement,it is found that the interlayer coupling changes from antiferromagnetic to ferromagnetic with increasing *** feature of material at the interface might be responsible for all these findings.

关键词： magnetoresistance slightly ferromagnetic

Effect of Cu surface segregation on the exchange coupling field of NiFe/FeMn bilayers

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Chinese Science Bulletin 2001年第22期46卷 1934-1936页

作者： LI Minghua YU Guanghua ZHU Fengwu JIANG Hongwei lai wuyan Department of Materials Physics Beijing University of Science and TechnologyBeijing 100083China Institute of Physics Chinese Academy of SciencesBeijing 100080China

The NiFe/FeMn bilayers with different buffer layers (Ta or Ta/Cu) were prepared by magnetron sputtering. Results show that the exchange coupling field of NiFe/FeMn fllms with Ta buffer is higher than that of the films with Ta/ Cu buffer. We analysed the reasons by investigating the crystallographic texture, surface roughness and surface segregation of both fllms, respectively. We found that the decrease of the exchange coupling fields of NiFe/FeMn fllms with Ta/ Cu buffer layers was mainly caused by the Cu surface segregation on NiFe surface.

关键词： NiFe/FeMn exchange coupling field texture surface roughness surface segregation.

Calculated Electronic Structure and Magnetic Properties of a New Ternary Rare-Earth-Iron Nitride R_(2)Fe_(17)N_(3)

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Chinese Physics Letters 1992年第5期9卷 262-265页

作者： ZENG Zhi ZHENG Qingqi lai wuyan Institute of Solid State Physics Academia SinicaHefei 230031 Institute of Physics Academia SinicaBeijing 100080

Electronic structure and magnetic properties of a new permanent magnetic material R_(2)Fe_(17)N_(3)(R=Sm or Nd)have been studied with self-consistent,spin polarized local spin density functional theory *** cluster models were used to study the electronic structure of this *** location of nitrogen atoms was determined by total energy calculation for clusters with various possible N sites in *** distribution of electrons and the magnetic moments for four kinds of inequivalent Fe atoms have been *** s-d(s-f)exchange interaction for different Fe sites and Sm atoms was also *** role of nitrogen atoms in R_(2)Fe_(17)Nδ(δ=0,3)was discussed.

关键词： magnetic structure Rare

XPS Studies of Chemical States of NiO/NiFe Interface

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Journal of University of Science and Technology Beijing 2001年第4期8卷 270-273页

作者： Guanghua Yu, Chunlin Chai, Fengwu Zhu, Jimei Xiao, wuyan lai 1)Materials Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China 2)Institute of Physics. Chinese Academy of Sciences. Beijing, 100080, China Univ Sci & Technol Beijing Sch Mat Sci & Engn Beijing 100083 Peoples R China Chinese Acad Sci Inst Phys Beijing 100080 Peoples R China

Ta/NTiO/NiFe/Ta multilayers were prepared by radio frequency reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 9.6 x 10(3) A/m. The compositions and chemical states at the interface region of NiO/NiFe were studied using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique, The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe = Ni + FeO and 3NiO+2Fe =3 Ni+Fe2O3. The thickness of the chemical reaction area estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products appear magnetic defects, and the exchange coupling field H-ex and the coereivity H-c of NiO/NiFe are affected by these defects.

关键词： chemical states exchange coupling field H-ex coercivity H-c X-ray photoelectron spectroscopy (XPS)

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高精度金属薄膜磁电阻效应测试系统

仪器仪表学报 2005年第12期26卷 1257-1261页

作者：王立锦于广华赖武彦朱逢吾北京科技大学材料科学与工程学院北京100083 中国科学院物理研究所磁学国家重点实验室北京100080

概述了探针法金属薄膜磁电阻效应测试的原理;分析了探针因子对测量结果的影响;设计组装了金属薄膜磁电阻效应的高精度测试系统,并给出了微机控制软件的关键子程序。该系统集数据采样、数据处理、参数计算等功能于一体,用户界面友好、测... 详细信息

概述了探针法金属薄膜磁电阻效应测试的原理;分析了探针因子对测量结果的影响;设计组装了金属薄膜磁电阻效应的高精度测试系统,并给出了微机控制软件的关键子程序。该系统集数据采样、数据处理、参数计算等功能于一体,用户界面友好、测试范围宽、精度高。系统软件还能显示和打印测量结果的数据曲线,并可生成标准数据文件供OR IG IN等数据处理软件调用。

关键词：金属薄膜磁电阻效应 C语言计算机辅助测试 IEEE-488

Erratum to “Accurate determination of film thickness by low-angle x-ray reflection”

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Chinese Physics B 2022年第9期31卷 658-658页

作者： Ming Xu Tao Yang Wenxue Yu Ning Yang Cuixiu Liu Zhenhong Mai wuyan lai Kun Tao Institute of Physics&Center for Condensed Matter Physics Chinese Academy of SciencesBejing 100080China Department of Materials Science Jilin Universiy Changchun 130023China Department of Materials Science Tsinghua University Beijing 100083China

Equation(6)in ***.090833(2000)is *** subsequent derivations were given based on the correct Eq.(6),so the conclusions in the paper are not ffected by the rrata.

关键词： erratum film thickness x-ray

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NiO钉扎的自旋阀的结构和磁性

北京科技大学学报 2000年第1期22卷 49-51页

作者：柴春林滕蛟于广华姜文博朱逢吾赖武彦北京科技大学材料科学与工程学院北京100083 北京出入境检验检疫局北京100022 中科院物理所北京100080

利用反应溅射的方法制备了ＮｉＯ薄膜，并研究了ＮｉＯ对ＮｉＦｅ薄膜的钉扎作用，结果表明钉扎场与反应溅射时的Ａｒ／Ｏ２比例、总的溅射气压、基底的粗糙度等有很大关系．利用光电子能谱（ＸＰ）分析了ＮｉＯ２中的Ｎｉ，Ｏ离子的价... 详细信息

利用反应溅射的方法制备了ＮｉＯ薄膜，并研究了ＮｉＯ对ＮｉＦｅ薄膜的钉扎作用，结果表明钉扎场与反应溅射时的Ａｒ／Ｏ２比例、总的溅射气压、基底的粗糙度等有很大关系．利用光电子能谱（ＸＰ）分析了ＮｉＯ２中的Ｎｉ，Ｏ离子的价态．并制备了ＮｉＯ钉扎的自旋阀Ｔａ／ＮｉＯ／ＮｉＦｅ／Ｃｕ／ＮｉＦｅ／Ｔａ，其磁电阻（ＭＲ）可达到２．２％，钉扎场为１０．４８ｋＡ／ｍ．

关键词：自旋阀磁性微结构氧化镍多层膜钉扎