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Nanoparticle assembly enabled by EHD-printed monolayers

Microsystems & Nanoengineering 2017年第1期3卷 154-162页

作者： Benjamin Francis Porter Nhlakanipho Mkhize harish bhaskaran Department of Materials University of OxfordOxford OX13PHUK

Augmenting existing devices and structures at the nanoscale with unique functionalities is an exciting *** is the ability to eventually enable at the nanoscale,a version of rapid prototyping via additive *** this requires a step-up in manufacturing for industrial use of these devices through fast,inexpensive prototyping with nanoscale *** this paper,we combine two very promising techniques—self-assembly and printing—to achieve additively nanomanufactured *** start by showing that monolayers can drive the assembly of nanoparticles into pre-defined patterns with single-particle resolution;then crucially we demonstrate for the first time that molecular monolayers can be printed using electrohydrodynamic(EHD)-jet *** functionality and resolution of such printed monolayers then drives the self-assembly of nanoparticles,demonstrating the integration of EHD with *** shows that such process combinations can lead towards more integrated process flows in ***,in-process metrology is a key requirement for any large-scale nanomanufacturing,and we show that Dual-Harmonic Kelvin Probe Microscopy provides a robust metrology technique to characterising these patterned structures through the convolution of geometrical and environmental *** represent a first step toward combining different additive nanomanufacturing techniques and metrology techniques that could in future provide additively nanomanufactured devices and structures.

关键词： additive nanomanufacturing dual-harmonic Kelvin probe microscopy electrohydrodynamic printing self-assembly 24 nanoparticles

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Exploiting rotational asymmetry for sub-50 nm mechanical nanocalligraphy

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Microsystems & Nanoengineering 2021年第5期7卷 61-68页

作者： Nikolaos Farmakidis Jacob L.Swett Nathan Youngblood Xuan Li Charalambos Evangeli Samarth Aggarwal Jan A.Mol harish bhaskaran Department of Materials University of OxfordParks RoadOxford 0X13PHUK Department of Physics Queen Mary University of LondonLondon El 4NSUK

Nanofabrication has experienced extraordinary progress in the area of lithography-led processes over the last decades,although versatile and adaptable techniques addressing a wide spectrum of materials are still *** probe lithography(SPL)offers the capability to readily pattern sub-100 nm structures on many surfaces;however,the technique does not scale to dense and multi-lengthscale ***,we demonstrate a technique,which we term nanocalligraphy scanning probe lithography(nc-SPL),that overcomes these ***-SPL employs an asymmetric tip and exploits its rotational asymmetry to generate structures spanning the micron to nanometer lengthscales through real-time linewidth *** specialized tip geometries and by precisely controlling the patterning direction,we demonstrate sub-50 nm patterns while simultaneously improving on throughput,tip longevity,and reliability compared to conventional SPL We further show that nc-SPL can be employed in both positive and negative tone patterning modes,in contrast to conventional *** underlines the potential of this technique for processing sensitive surfaces such as 2D materials,which are prone to tip-induced shear or beam-induced damage.

关键词： lithography tuning versatile

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