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检索条件"作者=FENG Jie,MEI jun,LI Jianguo and HU Dongping institute of system engineering china academy of engineering physics mianyang 621900,chinaYU Zhiming and FENG Jie School of Materials Science and engineering Center South University Changsha 4100083,china"

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Fabrication and Characterization of Nanocrystalline Diamond Films Using Hot Filament CVD

Fabrication and Characterization of Nanocrystalline Diamond ...

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2011 International Conference on Mechanical, Industrial, and Manufacturing engineering (MIME 2011)

作者： feng jie,mei jun,li jianguo and hu dongping institute of system engineering china academy of engineering physics mianyang 621900,chinayu zhiming and feng jie school of materials science and engineering center south university changsha 4100083,china

Nanocrystalline diamond films were deposited on Si substrates using bias-enhanced hot filament chemical vapour deposition(HFCVD) *** of hot filament structure and substrate bias on morphology and Raman spectroscopy of diamond films were investigated during *** characteristics and nano-mechanical performance of diamond films deposited by this system were *** results show that the double layer filament structure can enhance the voltage of positive substrate bias and increase the energy of particles and H content in the gas *** the double layer hot filament structure can increase the ratio of precursors re-nucleation and restrict the grain *** grain size was observed to be approximately 3 *** high quality nanocrystalline diamond films were deposited on a 75 mm diameter Si substrate,the thickness of film was about 50 micron and roughness was less than 8 nm by Ar/CH4/H2 gas ***,the friction coefficient of the films was 0.10 at the room temperature in the *** film has excellence wear and friction *** modulus is lager than 850GPa,and hardness large than *** film may be implemented into existing Si-based micro-system technologies and may have extensive foreground at MEMS technology field.

关键词： Surface characterizations Nanocrystalline diamond film Hot filament chemical vapor deposition

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