Effect of Substrate Bias on Microstructure and Properties of Tetrahedral Amorphous Carbon Films
作者单位：Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China Center of Composite Materials Harbin Institute of Technology Harbin 150001 China
会议名称：《The Fourth International Conference on Physical and Numerical Simulation of Materials (ICPNS’2004)》
会议日期：2004年
学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）]
关 键 词：Tetrahedral amorphous carbon Filtered cathodic vacuum arc substrate bias
摘 要：正The microstructure and properties of tetrahedral amorphous carbon （ta-C） films deposited by the filtered cathodic vacuum arc technology has been investigated by visible Raman spectroscopy, AFM and Nano-indentor. The Raman spectra have been fitted with a single skewed Lorentzian lineshape described by BWF function defining coupling coefficient, which characterizes the degree of asymmetry and is correlated with the sp3 content. When the substrate bias is -80 V, the sp3 content is the most and simultaneously the coupling coefficient is the least, following with the minimum root mean square surface roughness （Rq=0.23 nm） and the highest hardness （51.49 GPa）, Young’s modulus （512.39 GPa）, and critical scratching load （11.72 mN）. As the substrate bias is increased or decreased, the sp3 content and other properties lower correspondingly.