MgB2 Superconducting Films Fabricated on Copper Substrate by Hybrid Physical-chemical Vapor Deposition
会议名称:《International Conference on Superconducting Materials(ICSM 2006)》
会议日期:2006年
学科分类:080705[工学-制冷及低温工程] 07[理学] 070205[理学-凝聚态物理] 08[工学] 0807[工学-动力工程及工程热物理] 0702[理学-物理学]
关 键 词:MgB2 thick films, Cu substrate, HPCVD
摘 要:The thick MgB2 films have been successfully grown on the Cu substrate by the technique of hybrid physical-chemical vapor deposition (HPCVD). The films are about 2~3 μm and quite dense. They possess the Tc (onset), as high as 37-38 K, and sharp transition ~0.8 K. X-ray diffraction (XRD) indicates their polycrystalline character. The upper critical field at T=0K,HC2(0), is extrapolated as 15.3T. The controlled growth of MgB2 film on Cu substrate opens a new route in the preparation of MgB2 tape materials.