Fabrication of Ultra Deep High Aspect Ratio Electrical Isolation Trenches Using DRIE and Dielectric Refill
会议名称：《第三届国际仪器科学技术学术研讨会》
会议日期：2004年
学科分类：080802[工学-电力系统及其自动化] 0808[工学-电气工程] 08[工学]
关 键 词：Deep reactive ion etching (DRIE) Electrical isolation trenches Bulk microstructures monolithic integration
摘 要：This paper presents a novel technique to fabricate ultra deep high aspect ratio electrical isolation trenches using DRIE and dielectric refill. The relationship between trench profile and DRIE paramet