利于SR和FIB法制备含氟微米/纳米结构材料（英文）

作     者：A．Oshima T.Urakawa N.Fukutake Y.Takasawa K.Okamoto S.Seki T.Katoh S.Tagawa M.Washio 

作者单位：Research Institute for Science and Engineering(RISE)Waseda University3-4-1OkuboShinjukuTokyo169-8555JAPAN The Institute of Science and Industrial Research(ISIR)Osaka University8-1 MihogaokaIbarakiOsaka567-0047JAPAN Sumitomo Heavy IndustriesLtd.NishitokyoTokyo188-8585JAPAN 

会议名称：《第九届中国辐射固化年会》

会议日期：2008年

学科分类：07[理学] 070205[理学-凝聚态物理] 08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0702[理学-物理学] 

基　　金：supported in part by a Grant-in-Aid for Young Scientist(B)19760613 from the Japan Society for the Promotion of Science 

摘      要：正Micro-and nano-fabrications of various perfluorinated polymers were carried out by synchrotron radiation（SR）direct photo-etching,and by focused ion beam（FIB）direct mask less *** the irradiation,the etching depth has been evaluated by optical microscope and scanning electron microscope of the fabricated ***,SR-induced surface modifications were studied by solid-state 19F ’nuclear magnetic resonance（NMR）spectroscopy and differential scanning