INFLUENCE OF CONFIGURATIONS OF CHAMBER AND COIL ON UNIFORMITY OF PLASMA DISTRIBUTION FOR INDUCTIVELY COUPLED PLASMA ETCHER
会议名称：《2006年中国机械工程学会年会暨中国工程院机械与运载工程学部首届年会》
会议日期：2006年
学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）]
关 键 词：Dry etching process inductively coupled plasma (ICP) electron number density electron temperature CFD-ACE+.
摘 要：Based on the modules of plasma and electromagnetic field *** the commercial software, CFD-ACE+, a two-dimensional discharge model of an inductively coupled plasma (ICP) etcher was built. The spatia