Resists Based on Hyperbranched Polyesters for Microlens Array Fabrication
作者单位：Department of Polymer Science and Engineering State Key Lab for Polymeric Materials Engineering Sichuan University Cheng Du 610065 China
会议名称：《The 8th International Conference on Radiation Curing》
会议日期：2001年
学科分类：081704[工学-应用化学] 07[理学] 08[工学] 0817[工学-化学工程与技术] 070305[理学-高分子化学与物理] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0703[理学-化学]
关 键 词：Hyperbranched polyester. Photoresist. Microlens array UV curing MEMS
摘 要：正Three-component photoresists were prepared from hyperbranched polyester, multifunctional acrylate monomers and photoinitiator. The hyperbranched resin had -COOH, -OH and methacryloxy groups on their chain ends. The dried resist on glass substrate showed H- HB pencil hardness. Sensitivity and contrast upon UV exposure were tunable by development solution and the amount of photoinitiator. In a case, high sensitivity with E0 -5.5 mJ/cm2 and high contrast with μ-8were obtained for resist exposed with a mixed UV light and developed with TMAH aqueous. The resist exhibited a unique linear relationship on exposure time with etching depth. This property provided a controlling of surface profile of micro optical elements fabricated with photoresists. Microlens arrays （200×200 μm） were prepared with a moving-mask using this photoresist.