Surface Modification of Tri-CR aS Alternative to Hex-CR Electroplaing
作者单位：66 Sangnam-dong Changwon-shiKyungnam-do Korea 641 66 Sangnam-dong Changwon-shiKyungnam-do Korea 641 66 Sangnam-dong Changwon-shiKyungnam-do Korea 641 66 Sangnam-dong Changwon-shiKyungnam-do Korea 641 66 Sangnam-dong Changwon-shiKyungnam-do Korea 641 66 Sangnam-dong Changwon-shiKyungnam-do Korea 641
会议名称：《2006年上海电子电镀学术报告会》
会议日期：2006年
学科分类：081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术]
摘 要：正New post-treatment was undertaken on the trivalent chromium electrodeposit to develop the novel proeess as an alternative to hexavalent chromium electroplating. The surface modification of the chromium electrodeposited from trivalent bath was conducted and the comparison of the surface property with hexavalent chromium electrodeposited was made in view of *** suyface hardness was achieved by both of process. Characterization of