Local probe of the interlayer coupling strength of few-layers SnSe by contact-resonance atomic force microscopy
作者机构：State Key Laboratory of Digital Manufacturing Equipment and TechnologySchool of Mechanical Science and EngineeringHuazhong University of Science and TechnologyWuhan 430074China Beijing Key Laboratory of Optoelectronic Functional Materials&Micro-nano DevicesDepartment of PhysicsRenmin University of ChinaBeijing 100872China Beijing National Laboratory for Condensed Matter PhysicsInstitute of PhysicsChinese Academy of SciencesBeijing 100190China Key Laboratory of Inorganic Functional Materials and DevicesShanghai Institute of CeramicsChinese Academy of SciencesShanghai 200050China CAS Key Laboratory of Standardization and Measurement for NanotechnologyCAS Center for Excellence in NanoscienceNational Center for Nano science and TechnologyBeijing 100190China University of Chinese Academy of SciencesBeijing 100049China China North Vehicle Research InstituteBeijingChina
出 版 物：《Frontiers of physics》 (物理学前沿（英文版）)
年 卷 期：2020年第15卷第6期
页 面：105-113页
核心收录：
基 金：This project was supported by the Min-istry of Science and Technology(MOST)of China(Grant Nos.2016YFA0200700 and 2018YFE0202700) the National Natural Science Foundation of China(NSFC)(Grant Nos.21622304,61674045,11604063,11622437,11974422,61911540074,11804247,and 61674171) Strategic Priority Research Program,Key Research Program of Frontier Sciences,and Instrument Developing Project of Chinese Academy of Sciences(CAS)(Grant Nos.XDB000000,QYZDB-SSW-8Y5031,and YZ201418) Z.H.Cheng was supportod by Distinguished Technical Talents Project and Youth Innovation Promotion Association CAS,Fundamental Research Funds for the Central Universities,and Research Funds of Renmin University of China(Grant Nos.18XNLG01 and 19XNQ025) Calculations were performed at the Physics Lab of High-Performance Computing of Renmin University of China and Shanghal Supercomputer Center
主 题：2D materials interlayer bonding contact-resonance atomic force microscopy density functional theory
摘 要：The interlayer bonding in two-dimensional(2D)materials is particularly important because it is not only related to their physical and chemical stability but also afects their mechanical,thermal,elec-tronic,optical,and other *** address this issue,we report the direct characterization of the interlayer bonding in 2D SnSe using contact-resonance atomic force microscopy(CR-AFM)*** ***-specific CR spectroscopy and CR force spectroscopy measurements are performed on both SnSe and its supporting SiO2/Si substrate *** on the cantilever and contact mechanic models,the contact stifness and vertical Young s modulus are evaluated in comparison with SiO2/Si as a reference *** interlayer bonding of SnSe is further analyzed in combination with the semi-analytical model and density functional theory *** direct characteriza-tion of interlayer interactions using this non-destructive methodology of CR-AFM would facilitate a better understanding of the physical and chemical properties of 2D layered materials,specifically for interlayer intercalation and vertical heterostructures.
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