Zr_(55)Al_(10)Ni_(5)Cu_(30)amorphous alloy film prepared by magnetron sputtering method
Zr55Al10Ni5Cu30 非结晶的合金电影由磁控管劈啪作响方法准备了作者机构:School of Materials Science and EngineeringTianjin UniversityTianjin300072China Tianjin Key Laboratory of Composite and Functional MaterialsTianjin300072China Key Laboratory of Advanced Ceramics and Machining TechnologyMinistry of EducationTianjin300072China Department of PhysicsKings Abudulaziz UniversityJeddah22254Saudi Arabia
出 版 物:《Rare Metals》 (稀有金属(英文版))
年 卷 期:2021年第40卷第8期
页 面:2237-2243页
核心收录:
学科分类:080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)]
基 金:financially supported by the National Natural Science Foundation of China(No.51771131)
主 题:Magnetron sputtering Amorphous alloy Thin film Corrosion resistance Zr_(55)Al_(10)Ni_(5)Cu_(30)
摘 要:In this work,amorphous Zr_(55)Al_(10)Ni_(5)Cu_(30)alloy thin film was prepared on D36 steel substrate by magnetron sputtering *** film was characterized by scanning electron microscopy(SEM),X-ray diffraction(XRD),atomic force microscopy(AFM),hardness tester and nano *** behavior of the film was investigated in 3.5%NaCl aqueous solutions by an electrochemical *** room temperature,the amorphous alloy film was formed completely after sputtering for 5 *** surface morphology of the amorphous alloy film was uniform and *** of the amorphous alloy film improved the microhardness and corrosion resistance of the D36 *** amorphous alloy film(prepared at room temperature for 5 h)exhibited good adhesion strength with the *** as-sputtered sample exhibited a crevice corrosion trend when the sputtering time was too short(1 h)or too long(10 h).