Strain engineering in single-,bi-and tri-layer MoS_(2),MoSe_(2),WS_(2)and WSe_(2)
在单身者的紧张工程 -- ,双性人层和 tri 层 MoS2, MoSe2, WS2 和 WSe2作者机构:Materials Science FactoryInstituto de Ciencia de Materiales de MadridConsejo Superior de Investigaciones Cientificas28049MadridSpain
出 版 物:《Nano Research》 (纳米研究(英文版))
年 卷 期:2021年第14卷第6期
页 面:1698-1703页
核心收录:
学科分类:081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术]
基 金:This project has received funding from the European Research Council(ERC)under the European Union’s Horizon 2020 research and innovation programme(grant agreement no 755655,ERC-StG 2017 project 2D-TOPSENSE) R.F.acknowledges the support from the Spanish Ministry of Economy,Industry and Competitiveness through a Juan de la Cierva-formación fellowship 2017 FJCI-2017-32919.H.L.acknowledges the grant from China Scholarship Council(CSC)under No.201907040070
主 题:two-dimensional(2D)materials transition metal dichalcogenides strain engineering band gap differential reflectance
摘 要:Strain is a powerful tool to modify the optical properties of semiconducting transition metal dichalcogenides like MoS_(2),MoSe_(2),WS_(2) and WSe_(2).In this work we provide a thorough description of the technical details to perform uniaxial strain measurements on these two-dimensional semiconductors and we provide a straightforward calibration method to determine the amount of applied strain with high *** then employ reflectance spectroscopy to analyze the strain tunability of the electronic properties of single-,bi-and tri-layer MoS_(2),MoSe_(2),WS_(2) and WSe_(2).Finally,we quantify the flake-to-flake variability by analyzing 15 different single-layer MoS_(2) flakes.