Phosphosilicate glass film for optical waveguide by sol-gel method
Phosphosilicate glass film for optical waveguide by sol-gel method作者机构:National Integrated Optoelectronics Lab. Dept. of Electronics Eng. Jilin University Changchun 130012 China
出 版 物:《Optoelectronics Letters》 (光电子快报(英文版))
年 卷 期:2005年第1卷第2期
页 面:121-123页
学科分类:08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)]
摘 要:In this paper, silica-on-silicon erbium-doped phosphosilicate glass film material was fabricated for optical waveguides by sol-gel method. Samples were characterized and analyzed. It is demonstrated that we have got well-distributed, good translucent, alterable thickness of film and glass state erbium-doped phosphosilicate films material for optical waveguides by sol-gel method.