Effect of methane content and the oscillating electric field between electrodes on atmospheric Ar/methane plasma jet and DLC coating deposition

作     者：Reza SAFARI Farshad SOHBATZADEH Reza SAFARI;Farshad SOHBATZADEH

作者机构：Department of Atomic and Molecular PhysicsFaculty of Basic SciencesUniversity of MazandaranBabolsar 47416Iran 

出 版 物：《Plasma Science and Technology》 (等离子体科学和技术（英文版）)

年 卷 期：2020年第22卷第8期

页      面：76-89页

核心收录：

学科分类：07[理学] 070204[理学-等离子体物理] 0702[理学-物理学] 

主　　题：RF atmospheric plasma methane flow electric field 

摘      要：In this work,the effects of the methane gas flow and the internal oscillating electric field between electrodes on radio-frequency(RF)atmospheric pressure argon/methane plasma jet and process of diamond-like carbon(DLC)film deposition have been *** of RF atmospheric Ar/methane plasma jet such as active species density,length,electron temperature,appearance and ionization process of argon/methane plasma jet are changed due to the changing of methane flow content and electric field vector and its *** increasing methane flow,the formation of C2 hydrocarbon and CH band content is decreased because injected electrical energy to a mixture of Ar/methane gases is insufficient to stabilize the ionization process of methane gas and the electrical-chemical reaction rate is *** shortening the gas gap between two electrodes,electric field strength and its gradient are increased leading to more energy injection to the ***-chemical reactions are strengthened leading to increasing the CH band *** phenomena introduce the Ar/methane plasma jet in different modes causing to deposit the DLC film with different structures and *** using quartz glass and alumina ceramic as dielectric barriers tubes,RF atmospheric pressure Ar/methane plasma jet has been used to deposit DLC coating in different *** methane content and shortening the gas gap leads to decreasing sp3 bonded content and the quality of the deposited film.