Mid-Infrared InAs/GaSb Superlattice Planar Photodiodes Fabricated by Metal–Organic Chemical Vapor Deposition
Mid-Infrared InAs/GaSb Superlattice Planar Photodiodes Fabricated by Metal–Organic Chemical Vapor Deposition作者机构:Key Lab of Nanodevices and ApplicationsSuzhou Institute of Nano-tech and Nano-bionicsChinese Academy of SciencesSuzhou 215123China Nano-fabrication FacilitySuzhou Institute of Nano-tech and Nano-bionicsChinese Academy of SciencesSuzhou 215123China
出 版 物:《Chinese Physics Letters》 (中国物理快报(英文版))
年 卷 期:2020年第37卷第6期
页 面:115-118页
核心收录:
学科分类:08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0803[工学-光学工程] 0704[理学-天文学]
基 金:Supported by the National Natural Science Foundation of China(Grant Nos.61874179 61804161 and 61605236)。
摘 要:Mid-wavelength infrared planar photodiodes were demonstrated,in which both the epitaxy growth of InAs/GaSb superlattices and the thermal diffusion of p-type dopant were performed in production-scale metal-organic chemical vapor deposition reactors.The formation of a planar homojunction was confirmed by secondary ion mass spectroscopy and itsⅠ-Ⅴcharacteristics.A cut-off wavelength around 5μm was determined in 77 K optical characterization,and photo-current as high as 600 nA was collected from a reverse-biased planar diode of 640μm diameter.These preliminary results were obtained despite the structural degradation revealed by x-ray diffraction,and we attribute the degradation to the concert of thermal annealing and high Zn concentration behind the diffusion front.