Penetration depth and concentration distribution for implanted heavy ions with low energies in plant seeds by SEM and EDS
Penetration depth and concentration distribution for implanted heavy ions with low energies in plant seeds by SEM and EDS作者机构:Key Laboratory for Beam Technology and Material Modificationof Ministry of Education Institute of Low Energy Nuclear PhysicsBeijing Normal University Beijing Radiation Center Department of Biology Beijing Normal University Center for Analysis and Testing Beijing Normal University
出 版 物:《Nuclear Science and Techniques》 (核技术(英文))
年 卷 期:2001年第12卷第1期
页 面:26-31页
核心收录:
学科分类:09[农学] 0903[农学-农业资源与环境]
基 金:the National Natural Science Foundation (No. 19890303)
摘 要:The penetration depth and concentration distribution of implanted ions have been studied for low energy heavy ions implanted in the dry seeds of plant, such as peanut, mung beau, sunflower, wheat and radish seeds, etc. by SEM+EDS. The results .how that the maximum penetration depth is about 12μm for V+ with an energy 200 keV implanted in cotyledon of the peanut, 18pm, spin, 20μm for V2+ with 90 keV implanted in sunflower, wheat, radish seeds, respectively. The penetration depth of implanted Cu2+ with 80 keV is about 90μm in the remainder funicle derivative of the mung beau seeds. The experimental result of the maximum penetration depth of implanted V+ in the peanut seeds was compared with the calculated value of the TRIM95.