Ultra-broadband reflector using double-layer subwavelength gratings

作     者：JINLONG ZHANG SHUAIKAI SHI HONGFEI JIAO XIAOCHUAN JI ZHANSHAN WANG XINBIN CHENG 

作者机构：MOE Key Laboratory of Advanced Micro-Structured MaterialsShanghai 200092China Institute of Precision Optical EngineeringSchool of Physics Science and EngineeringTongji UniversityShanghai 200092China IFSA Collaborative Innovation CenterShanghai Jiao Tong UniversityShanghai 200240China 

出 版 物：《Photonics Research》 (光子学研究（英文版）)

年 卷 期：2020年第8卷第3期

页      面：426-429页

核心收录：

学科分类：08[工学] 0803[工学-光学工程] 

基　　金：National Natural Science Foundation of China(61522506,61621001,U1630124,U1630123) National Program on Key Research Project(2016YFA0200900) Innovation Program of Shanghai Municipal Education Commission 

主　　题：lithography layer reflectance 

摘      要：Double-layer high-contrast subwavelength gratings that are separated by a dielectric space layer are investigated to achieve ultra-broadband *** reflection phase of subwavelength gratings and the propagation phase shift between two gratings are manipulated to expand reflection bandwidth by properly stacking two reflective gratings.A reflector exhibiting a 99%reflectance bandwidth of^1080 nm in the near-infrared is *** this reflector is prepared using laser interference lithography and ion beam planarization,and an ultra-broadband reflection is achieved with reflectance exceeding 97%over a wavelength range of 955 nm in the near-infrared region.