Comparison Study on the Semiconductive and Dissolution Behaviour of 316L and Alloy 625 in Hydrochloric Acid Solution

作     者：Zhu Wang Zi-Ru Zhang Lei Zhang Zhe Feng Min-Xu Lu Zhu Wang;Zi-Ru Zhang;Lei Zhang;Zhe Feng;Min-Xu Lu

作者机构：Institute for Advanced Materials and TechnologyUniversity of Science and Technology BeijingBeijing 100083China 

出 版 物：《Acta Metallurgica Sinica(English Letters)》 (金属学报（英文版）)

年 卷 期：2020年第33卷第3期

页      面：403-414页

核心收录：

学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：financially supported by the Fundamental Research Funds for the Central Universities (No.FRFIC-18-007) the China Postdoctoral Science Foundation(No. 2019M650487) 

主　　题：Stainless steel Induced coupled plasma(ICP) Polarization X-ray photoelectron spectroscopy(XPS) Passive films 

摘      要：The corrosion behaviour of 316L and Alloy 625 was investigated using cyclic polarization,electrochemical impedance spectroscopy,X-ray photoelectron spectroscopy,Auger electron spectroscopy and induced coupled plasma-optical emis sion *** results indicated that Alloy 625 showed better corrosion resistance than 316L and the prolonging immersion time could enhance corrosion resistance of the two *** passive film formed on the surface of 316L exhibited an electronic structure of p-p heterojunction,with Fe3O4 and Cr2O3 enriched in the outer and inner layers,***,Alloy 625 presented the electronic structure of n-p heterojunction dominated by the outer Fe2O3/NiFe2O4 and inner *** resulted in the opposite semiconductive properties of the passive films formed on the two *** the acid solutions,Fe and Mo suffered from selective dissolution while Cr and Ni were relatively *** corrosion rates were mainly dominated by the dissolution of *** 625 presented better corrosion resistance than 316L due to the obviously lower content of Fe and the higher content of Cr and Ni in the passive *** continuously selective dissolution of iron resulted in the increase in Cr/Fe ratio in the passive film,which was responsible for the enhancement in corrosion resistance.