The Formation of Excited Molecules Chloride Argon, Chlorine and Hydroxyl Radicals in the Nanosecond Barrier Discharge
The Formation of Excited Molecules Chloride Argon, Chlorine and Hydroxyl Radicals in the Nanosecond Barrier Discharge作者机构：Faculty of Physics Uzhgorod National University Uzhgorod 88000 Ukraine
出 版 物：《Journal of Electrical Engineering》 (电气工程（英文版）)
年 卷 期：2014年第2卷第2期
页 面：96-100页
学科分类：080802[工学-电力系统及其自动化] 0808[工学-电气工程] 08[工学]
主 题：Nanosecond barrier discharge argon chloride carbon tetrachloride emission.
摘 要：The results of an experimental study of radiation characteristics of a barrier discharge in a mixture ArCCl4 were presented in this paper. Formation of molecules ArCI（B） and CI2（D＇） in the barrier discharge plasma depends strongly on the partial pressure of freon vapor is shown. The intensity of the radiation band CI2（D＇-A＇） on the value of the pulse repetition rate current at a charging voltage Ua = 13 kV was close to the line that indicates the possibility of increasing the average power of the VUV-UV discharge at frequencies f〉1 kHz.
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