A New Method of Photopatterning with LB Films Based on a Chemically Amplified Mechanism

作     者：LI Tie-sheng Masaya Mitsuishi Tokuji Miyashta 

作者机构：Department of Chemistry Zhengzhou University Zhengzhou 450052 P. R. China Institute of Multidisciplinary Research for Advanced Materials Tohoku University Sendai 980-8577 Japan 

出 版 物：《Chemical Research in Chinese Universities》 (高等学校化学研究（英文版）)

年 卷 期：2006年第22卷第4期

页      面：543-546页

核心收录：

学科分类：081704[工学-应用化学] 07[理学] 08[工学] 0817[工学-化学工程与技术] 070305[理学-高分子化学与物理] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0703[理学-化学] 

基　　金：Supported by a Grant-in-Aid for Scientific Research from the Japanese Ministry of Education  Sports  and Culture( No.14205130)  and Natural Science Foundation of Henan Province(No. 0611020100) 

主　　题：LB film Copolymer Photopatterning Chemically amplified resist 

摘      要：A new approach to introducing a photoacid generator（PAG） into Langmuir-Blodgett （LB） films to draw photopatterns as a lithographic process is described here. The chemically amplified positive-tone resist system used here consists of two components ： a copolymer, poly （ dodecrylacrylamide-co-4-t-butyloxylvinyl-phenylcarbonate ） [ P （ DDA-t- BVPC53 ） ] and a PAG, tri （2,3-dibromopropyl） isocyanurate （ TDBPIC ）. In the two-component system, the acid generated by the PAG catalyzes the deprotection reaction of P（ DDA-t-BVPC53）, to remove the tert-butoxycarbonyl group（t-BOC） in the exposed region during the postexposure baking process, thus rendering the exposed region soluble to alkaline aqueous solvents to form a positive tone. Photolithographic properties of the LB films have been evaluated. The patterns can be resolved with a resolution of 1 μm line width by UV irradiation, followed by development with an alkaline solution. The LB films can be used to generate etched gold relief images on a glass substrate via an aqueous iodide, like ammonium iodide, in alcohol/water as the etchant. The etch resistance of such LB films is sufficiently good, allowing patterning of a gold film suitable for photomask fabrication.