Schwarzschild microscopes in vacuum ultraviolet and soft X-ray regions
Schwarzschild microscopes in vacuum ultraviolet and soft X-ray regions作者机构：Institute of Multidisciplinary Research for Advanced MaterialsTohoku University2-1-1 KatahiraAobakuSendai 980-8577Japan
出 版 物：《Nuclear Science and Techniques》 (核技术（英文）)
年 卷 期：2005年第16卷第3期
页 面：129-138页
核心收录：
主 题：施瓦兹希尔物镜 真空紫外线辐射 软X-射线 显微镜 光电子
摘 要：Microscopes in vacuum ultraviolet and soft X-ray regions using a normal incidence type of Schwarzschild objective are reviewed. The objective consists of a concave mirror and a convex mirror coated with a high reflectance multilayer,having a large numerical aperture comparing with other objectives. The microscopes have been used to diagnose inertia-confinement-fusion plasmas,and to investigate small samples or microstructures of in- organic and organic materials by imaging them using laboratory light sources. Synchrotron radiation has been also used to obtain a microbeam for a photoelectron scanning microscope with a spatial resolution of 0.1 μm. The struc- ture and performance of two laboratory microscopes developed at Tohoku University are demonstrated. One of them is a soft X-ray emission imaging microscope. An image of an artificial pattern made of W and SiO2 on Si wafer by focusing Si L emission was presented. The other is an ultraviolet photoelectron scanning microscope using a He (he- lium) gas discharge lamp. The valence band spectra of a microcrystal of FeWO4 were presented. Furthermore other applications such as demagnifying optics for lithography and optics to gather fluorescence for emission spectroscopy are introduced.
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