Thermal Diffusivity of Film/Substrate Structures Characterized by Transient Thermal Grating Method
Thermal Diffusivity of Film/Substrate Structures Characterized by Transient Thermal Grating Method作者机构:Laboratory of Modern Acoustics Institute of Acoustics Nanjing University Nanjing 210093 Department of Micro-engineering Kyoto University Kyoto 606-8501 Japan
出 版 物:《Chinese Physics Letters》 (中国物理快报(英文版))
年 卷 期:2008年第25卷第1期
页 面:176-179页
核心收录:
学科分类:08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程(可授工学、理学学位)]
基 金:Supported by the National Natural Science Foundation of China under Grant No 10574073
摘 要:Transient thermal grating method is used to measure the thermal diffusivity of absorbing films deposited on transparent substrates. According to periodically modulated dielectric constant variations and thermoelastic deformations of the thin films caused by the transient thermal gratings, an improved optical diffraction theory is presented. In the experiment, the probing laser beam reflectively diffracted by the thermal grating is measured by a photomultiplier at different grating fringe spaces. The thermal diffusivity of the film can be evaluated by fitting the theoretical calculations of diffraction signals to the experimental measured data. The validity of the method is tested by measuring the thermal diffusivities of absorbing ZnO films deposited on glass substrates.