Influence of Chemical Stability on the Fabrication of MnGa-based Devices
作者机构:State Key laboratory of Superlattice and microstructures Institute of Semiconductors Chinese Academy of Sciences Cornell University Ithaca New York 14850 USA
出 版 物:《Journal of Microelectronic Manufacturing》 (微电子制造学报(英文))
年 卷 期:2019年第2卷第3期
页 面:13-16页
学科分类:0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学]
主 题:Chemical stability Perpendicular magnetic anisotropy Spintronics Wet etching
摘 要:Ferromagnetic films of L10-ordered MnGa have shown promise not only in the applications in ultrahigh-density magnetic recording and spintronic memories,oscillators,and sensors,but also in controllable studies of novel electrical transport ***,the stability of MnGa in chemicals and oxygen plasma that are commonly used in the standard micronano-fabrication process has remained *** this work,we report a systematic study on the chemical stability of the MnGa films in acids,acetone,ethanol,deionized water,tetramethylammonium hydroxide (TMAOH) and oxygen *** find that MnGa is very stable in acetone and ethanol,while can be attacked substantially if soaked in TMAOH solution for sufficiently long *** water and acids (e.g.,HCl,H3PO4 and H2SO4 solutions) attack MnGa violently and should be avoided whenever *** addition,oxygen plasma can passivate the MnGa surface by oxidizing the *** results provide important information for the fabrication and the integration of MnGa based spintronic devices.