The growth of Staphylococcus aureus and Escherichia coli in low-direct current electric fields

作     者：Dunya Zituni Heidi Schtt-Gerowitt Marion Kopp Martin Krnke Klaus Addicks Christian Hoffmann Martin Hellmich Franz Faber Wilhelm Niedermeier 

作者机构：Department of Prosthetic Dentistry School of Dental and Oral Medicine Cologne University Institute for Medical Microbiology Immunology and HygieneCologne University Institute for Anatomy I Cologne University Institute for Medical Statistics Informatics and Epidemiology Cologne University Department of Pre-Clinical Dentistry School of Dental and Oral Medicine Cologne University 

出 版 物：《International Journal of Oral Science》 (国际口腔科学杂志（英文版）)

年 卷 期：2014年第6卷第1期

页      面：7-14页

核心收录：

学科分类：1003[医学-口腔医学] 100302[医学-口腔临床医学] 10[医学] 

主　　题：direct current Escherichia coli electrogaNanism gold electrode Staphylococcus aureus 

摘      要：Electrical potentials up to 800 mV can be observed between different metallic dental restorations. These potentials produce fields in the mouth that may interfere with microbial communities. The present study focuses on the impact of different electric field strengths （EFS） on the growth of Staphylococcus aureus （ATCC 25923） and Escherichia coil （ATCC 25922） in vitro. Cultures of S. aureus and E. coil in fluid and gel medium were exposed to different EFS. Effects were determined by calculation of viable counts and measurement of inhibition zones. In gel medium, anodic inhibition zones for S. aureuswere larger than those for E. coliat all field strength levels. In fluid medium, the maximum decrease in the viable count of S. aureus cells was at 10 V.m-1. Field-treated S. aureus cells presented ruptured cell walls and disintegrated cytoplasm. Conclusively, S. aureus is more sensitive to increasing electric field strength than E. coll.