A selective area growth double stack active layer electroabsorption modulator integrated with a distributed feedback laser
A selective area growth double stack active layer electroabsorption modulator integrated with a distributed feedback laser作者机构:Key Laboratory of Semiconductor Materials Institute of Semiconductor Chinese Academy of Sciences Beijing 100083 China
出 版 物:《Chinese Science Bulletin》 (Chin. Sci. Bull.)
年 卷 期:2009年第54卷第20期
页 面:3627-3632页
核心收录:
学科分类:080901[工学-物理电子学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程]
基 金:Supported by the National High-Tech Research and Development Program of China (Grant Nos.2001AA312050 2005AA31g060 and 2007AA-03Z417)
主 题:分布反馈激光器 电吸收调制器 选择区域生长 有源层 集成 堆积 EML 制备方法
摘 要:A new method for fabricating electroabsorption modulator integrated with a distributed feedback laser(EML) was *** the method we fabricated a selective area growth double stack active layer EML(SAG-DSAL-EML).Through comparing with other fabrication methods of EMLs,the characters and the merits of the new method presented in this paper were discussed.