Fluorescence Enhancement Ratio Dropdown at Low Fluences during Femtosecond Double Pulse Laser Ablation
Fluorescence Enhancement Ratio Dropdown at Low Fluences during Femtosecond Double Pulse Laser Ablation作者机构：Institute of Atomic and Molecular Physics Jilin University Changchun 130021 Department of Chemistry University of Illinois at Chicago Chicago Illinois 60607-7061 USA
出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)
年 卷 期：2008年第25卷第7期
页 面：2653-2656页
核心收录：
学科分类：080902[工学-电路与系统] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0704[理学-天文学]
基 金：Supported by the National Natural Science Foundation of China under Grant No 10404008 the National Science Foundation from United States under Grants Nos PHY-0200812 CHE-0120997 and CHE-0640306 and the Motorola Physical Realization Research Center in Schaumburg IL
主 题：the power-law exponents precipitation durative abrupt precipitation change
摘 要：In the study of double pulse ablation of materials （silicon and copper）, a dropdown of double pulse to single pulse fluorescence signal enhancement at low fluences is observed. The dropdown is analysed with a simple theoretical one-dimensional heat diffusion model and verified by fluorescence time constants change as a function of fluence. The dropdown is explained as a result of liquid-solid mixture layer at the liquid and solid boundary. The effect of the layer becomes important at low fluences.
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