Influence of the low-frequency source parameters on the plasma characteristics in a dual frequency capacitively coupled plasma reactor:Two dimensional simulations

作     者：Xiang Xu, Hao Ge, Shuai Wang, Zhongling Dai, Younian Wang , Aimin Zhu State Key Lab of Materials Modification by Electron, Ion and Laser Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116023, China 

作者机构：State Key Lab of Materials Modification by Electron Ion and Laser Beams School of Physics and Optoelectronic Technology Dalian University of Technology Dalian 116023 China 

出 版 物：《Progress in Natural Science:Materials International》 (自然科学进展·国际材料(英文))

年 卷 期：2009年第19卷第6期

页      面：677-684页

核心收录：

学科分类：07[理学] 070204[理学-等离子体物理] 0702[理学-物理学] 

基　　金：supported by the National Natural Science Foundation of China (Grant Nos.10635010 and10572035) 

主　　题：Dual frequency Capacitively coupled plasma Fluid simulation 

摘      要：A two-dimensional (2D) fluid model is presented to study the discharge of argon in a dual frequency capacitively coupled plasma (CCP) reactor. We are interested in the influence of low-frequency (LF) source parameters such as applied voltage amplitudes and low frequencies on the plasma characteristics. In this paper, the high frequency is set to 60 MHz with voltage 50 V. The simulations were carried out for low frequencies of 1, 2 and 6 MHz with LF voltage 100 V, and for LF voltages of 60, 90 and 120 V with low frequency 2 MHz. The results of 2D distributions of electric field and ion density, the ion flux impinging on the substrate and the ion energy on the powered electrode are shown. As the low frequency increases, two sources become from uncoupling to coupling. When two sources are uncoupling, the increase in LF has little impact on the plasma characteristics, but when two sources are coupling, the increase in LF decreases the uniformities of ion density and ion flux noticeably. It is also found that with the increase in LF voltage, the uniformities in the radial direction of ion density distribution and ion flux at the powered electrode decreases significantly, and the energy of ions bombarding on the powered electrode increases significantly.