Polishing technology of surface for diamond film using the method of laser ablation

作     者：Gu, CZ Jin, ZS Wang, YG Zhuang, RS Lu, XY Zhao, ST Zou, GT 

作者机构：Jilin Univ State Key Lab Superhard Mat Changchun 130023 Peoples R China 

出 版 物：《Chinese Science Bulletin》 (中国科学通报)

年 卷 期：1997年第42卷第23期

页      面：2010-2013页

核心收录：

学科分类：08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：diamond film laser ablation polishing of surface. 

摘      要：THE chemical vapor deposition (CVD) methods have been developed so much in the past tenyears that it has become less expensive to deposit a thick CVD diamond film than to polish thediamond. The polycrystalline films nomnally exhibit a pronounced roughness because there arelots of large pointed grains on the surface of the films. On the other hand, the thickness unityof diamond film is poor because of the effects of deposition condition, especially for those syn-thesized by the methods of hot filament CVD (HFCVD) and electron assistant CVD(EACVD). Poor thickness unity and rough surface of thick diamond film limits their poten-