PREPARATION OF TiN FILMS BY N_2 ASSISTED Xe^+ ION BEAM ENHANCED DEPOSITION AND THEIR MECHANICAL PROPERTIES

作     者：WANG Xi YANG Genqing LIU Xianghuai ZHENG Zhihong HUANG Wei ZHOU Zuyao ZOU Shichang Ion Beam Laboratory,Shanghai Institute of Metallurgy,Academia Sinica,shanghai,China 

作者机构：Shanghai Inst of Metallurgy Acad Sinica Shanghai China 

出 版 物：《Acta Metallurgica Sinica(English Letters)》 (金属学报（英文版）)

年 卷 期：1992年第5卷第11期

页      面：370-374页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：TiN film ion beam enhanced deposition mechanical properties 

摘      要：A new method for preparation of hard TiN films has been developed by using electron beam evaporation-deposition of Ti and bombardment with 40 keV Xe^+ ion beam in a N_2 gas *** synthesized TiN films were superior to PVD and CVD ones in respects of improved adhesion to substrate and low preparing *** exhibited good wear resistance and high hardness up to 2200 kg/mm^*** industrial applications have been reported.