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Dark count rate and band to band tunneling optimization for single photon avalanche diode topologies

Dark count rate and band to band tunneling optimization for single photon avalanche diode topologies

作     者:Taha Haddadifam Mohammad Azim Karami Taha Haddadifam;Mohammad Azim Karami

作者机构:Iran University of Science and Technology 

出 版 物:《Chinese Physics B》 (中国物理B(英文版))

年 卷 期:2019年第28卷第6期

页      面:458-464页

核心收录:

学科分类:08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)] 0704[理学-天文学] 0803[工学-光学工程] 

主  题:single-photon avalanche diode digital silicon photomultiplier dark count rate 

摘      要:This paper proposes two optimal designs of single photon avalanche diodes(SPADs) minimizing dark count rate(DCR). The first structure is introduced as p^+/pwell/nwell, in which a specific shallow pwell layer is added between p^+and nwell layers to decrease the electric field below a certain threshold. The simulation results show on average 19.7%and 8.5% reduction of p^+/nwell structure’s DCR comparing with similar previous structures in different operational excess bias and temperatures respectively. Moreover, a new structure is introduced as n+/nwell/pwell, in which a specific shallow nwell layer is added between n+and pwell layers to lower the electric field below a certain threshold. The simulation results show on average 29.2% and 5.5% decrement of p^+/nwell structure’s DCR comparing with similar previous structures in different operational excess bias and temperatures respectively. It is shown that in higher excess biases(about 6 volts), the n+/nwell/pwell structure is proper to be integrated as digital silicon photomultiplier(dSiPM) due to low DCR. On the other hand, the p^+/pwell/nwell structure is appropriate to be utilized in dSiPM in high temperatures(above 50?C) due to lower DCR value.

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