PLASMA MODEL-ONE MODEL OF ELECTROMAGNETIC RESPONSE OF MATTER

作     者：H. Du, J. Gong, C. Sun, A.L. Ji, R.F. Huang and L.S. Wen (The Department of Surface Engineering of Materials, Institute of Metal Research, The Chinese Academy of Sciences, Shenyang 110016, China) 

作者机构：The Department of Surface Engineering of Materials Institute of Metal Research The Chinese Academy of Sciences 

出 版 物：《Acta Metallurgica Sinica(English Letters)》 (金属学报（英文版）)

年 卷 期：2001年第14卷第6期

页      面：501-505页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：Aluminum Dielectric films Electromagnetic wave absorption Nanostructured materials 

摘      要：The prerequisite and mode of electromagnetic response of nano metal/dielectric films to electromagnetic wave field were suggested. With the carrier density and the reflectance, transmittance of the film, the plasma frequency and the dependence of absorptance on the frequency of electromagnetic wave field were calculated respectively. The calculated results accorded with the experimental ones, which proved the plasma resonance is one mode of electromagnetic response.