Confining effect of oxide film on tin whisker growth
Confining effect of oxide film on tin whisker growth作者机构:Jiangsu Key Laboratory of Advanced Metallic Materials School of Materials Science and Engineering Southeast University Nanjing 211189 China Jiangsu Key Laboratory of Construction Materials School of Materials Science and Engineering Southeast University Nanjing 211189 China
出 版 物:《Journal of Materials Science & Technology》 (材料科学技术(英文版))
年 卷 期:2019年第35卷第8期
页 面:1735-1739页
核心收录:
学科分类:08[工学] 0805[工学-材料科学与工程(可授工学、理学学位)]
基 金:supported by the National Natural Science Foundation of China (No. 51731004, 51501038 and 51671054) Zhishan Scholar Program the Fundamental Research Funds for the Central Universities
主 题:Whisker MAX phase Oxide film Morphology
摘 要:Spontaneous tin whisker growth has been mysterious and catastrophic for more than half century. The difficulty in the research on this topic consists of the randomness of the whisker growth, the slow growth rate and many other tricky factors. Herein, with Ti2SnC-Sn as a new platform, fast tin whisker growth is realized to facilitate the research. The whisker morphology is found to be modulated by oxide film. A striated whisker morphology forms as growing in air, whereas a faceted morphology forms in ***, the evolution to the faceted morphology is attributed to the reconstruction of the whisker surface driven by surface energy reduction. The findings might open a new avenue to uncover the myths of this long-standing issue, and thus develop a long-awaited lead-free tin whisker mitigation strategy.