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Development of an Emulator for the Plasma Process Control

Development of an Emulator for the Plasma Process Control

作     者:Marie-Pierre Planche Taikai Liu Sihao Deng Ghislain Montavon 

作者机构:Research Institute on Transport Energy and Society--Laboratory of Engineering Research on Materials Processes and SurfacesUniversity of Technology of Belfort-Montbeliard Belfort 90010 France 

出 版 物:《Journal of Mechanics Engineering and Automation》 (机械工程与自动化(英文版))

年 卷 期:2015年第5卷第1期

页      面:10-18页

学科分类:07[理学] 08[工学] 070204[理学-等离子体物理] 0802[工学-机械工程] 0835[工学-软件工程] 080201[工学-机械制造及其自动化] 0702[理学-物理学] 

主  题:Atmospheric plasma spray process parameters artificial neural networks fuzzy logic emulator 

摘      要:This work aims at developing an automatic system for the control of the APS (air plasma spraying) plasma process in which some instability phenomena are present. APS is a versatile technique to produce coatings of powder material at high deposition rates. Using this technique, powder particles are injected into a plasma jet, where they are melted and accelerated towards a substrate. The coating microstructures and properties depend strongly on the characteristics of the plasma jet, which can be controlled by the adjustment of the process parameters. However, the imeractions among the spray variables, render optimization and control of this process are quite complex. Understanding relationships between coating properties and process parameters is mandatory to optimize the process technique and the product quality. We are interested in this work to build an on-line control model for the APS process based on the elements of artificial intelligence and to build an emulator that replicates the dynamic behavior of the process as closely as possible.

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