Responding Depth of Photocatalytic Activity of TiO_2 Self-assembled Films
Responding Depth of Photocatalytic Activity of TiO_2 Self-assembled Films作者机构:Ctr. of Mat. Phys. and Chem. Sch. of Sci. Beijing Univ. of Aero. and Astron. Beijing 100083 China Dept. of Mat. Sci. Lanzhou Univ. Lanzhou 730000 China
出 版 物:《Journal of Materials Science & Technology》 (材料科学技术(英文版))
年 卷 期:2004年第20卷第4期
页 面:472-474页
核心收录:
学科分类:08[工学] 0817[工学-化学工程与技术] 0806[工学-冶金工程] 0805[工学-材料科学与工程(可授工学、理学学位)] 0703[理学-化学] 0802[工学-机械工程] 0801[工学-力学(可授工学、理学学位)] 0702[理学-物理学]
基 金:the National Natural ScienceFoundation of China(No.59982002) Foundation of National Key Lab.of Advanced Metal Materials.
主 题:Responding depth Titanium dioxide Photocatalytic activity Electrostatically self-assembly
摘 要:The electrostatically self-assembly method is getting strategically important to prepare multilayer thin films. With careful choice of component materials, this method should allow for the preparation of multilayer thin films with a variety of excellent technological properties. Ti02/PSS multilayer thin films with ordered structure were prepared by electrostatic self-assembly method. UV-Vis-NIR spectrophotometer, X-ray photoelectron spectroscopy (XPS), and atom force microscopy (AFM) were used to characterize the structure and performance of the multilayer films. Because electrostatically self-assembly method allows molecular-level control over the film composition and thickness, this paper studied the responding depth of photocatalytic activity of Ti02 self-assembled films in detail.