High contrast amplification at 1053 nm limited by pulse stretching-compressing process

作     者：陆效明 彭宇杰 李妍妍 郭晓杨 冷雨欣 隋展 许毅 王新亮 

作者机构：School of Physics Science and EngineeringTongji University State Key Laboratory of High Field Laser PhysicsShanghai Institute of Optics and Fine MechanicsChinese Academy of Sciences Shanghai Institute of Laser Plasma 

出 版 物：《Chinese Optics Letters》 (中国光学快报（英文版）)

年 卷 期：2016年第14卷第2期

页      面：88-92页

核心收录：

学科分类：080902[工学-电路与系统] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 

主　　题：Amplification Chirp modulation Frequency doublers Glass Laser optics Ultrashort pulses 

摘      要：We report on our high-contrast laser based on high-contrast, high-energy seed injection, low-gain optical para- metric chirped pulse amplification （OPCPA）, and Nd：glass amplifiers, which can be used as the high-contrast front end of a high-power Nd：glass chirped pulse amplification （CPA） laser system. The energy of the stretched 1053 nm high-contrast seed pulse increases to 60 DJ by optimizing the frequency doubling crystal in the pulse cleaning device. After passing through a two-stage low-gain OPCPA, a 2-pass 2-rod Nd：glass amplifier, and a compressor the amplified pulse of 131 mJ/282 fs is achieved. The third-order correlation scanning measurement shows that the pulse contrast in the tens of ps range is about 10^-7-10^-8. With the high-contrast seed passing through the stretcher and compressor only, the contrast measurement indicates that the stretching-compressing process leads mainly to the contrast degradation of the amplified pulse.