Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

作     者：ZHANG Yi-chen SUN Shao-ni ZHOU Yi MA Sheng-ge BA De-chun 

作者机构：School of Mechanical Engineering and Automation Northeastern University Shenyang 110004 China National R＆D Center for Surface Engineering of China Shenzhen 518029 China 

出 版 物：《Chinese Journal of Aeronautics》 (中国航空学报（英文版）)

年 卷 期：2006年第19卷第B12期

页      面：119-125页

核心收录：

学科分类：080503[工学-材料加工工程] 081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术] 0805[工学-材料科学与工程（可授工学、理学学位）] 

主　　题：fluid machinery and engineering diamond-like carbon films middle frequency unbalanced magnetron sputtering hall ion source 

摘      要：Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.