Large-area surface-enhanced Raman scattering-active substrates fabricated by femtosecond laser ablation

作     者：ZHU ZhiQing YAN ZhenDong ZHAN Peng WANG ZhenLin 

作者机构：School of Physics and National Laboratory of Solid State MicrostructuresNanjing University 

出 版 物：《Science China(Physics,Mechanics & Astronomy)》 (中国科学：物理学、力学、天文学（英文版）)

年 卷 期：2013年第56卷第9期

页      面：1806-1809页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0803[工学-光学工程] 0704[理学-天文学] 

基　　金：supported by the National Natural Science Foundation of China (Grant Nos.51271092 and 11274160) 

主　　题：表面增强拉曼散射 SERS活性 飞秒激光 激光烧蚀 面积 基底 制备 罗丹明6G 

摘      要：A rapid and simple approach to fabricate large-area surface-enhanced Raman scattering-active(SERS-active) substrates is reported.The substrates are fabricated by using femtosecond laser(fs-laser) direct writing on Silicon wafers,followed by thin-film coating of metal such as gold.The substrates are demonstrated to exhibit signal homogeneity and good enhancement ability for SERS.The maximum enhancement factor(EF) up to 3×10 7 of such SERS substrates for rhodamine 6G(R6G) at 785 nm excitation wavelength was measured.This technique could demonstrate a functional microchip with SERS capability of signal homogeneity,high sensitivity and chemical stability.