聚乙酰亚胺涂敷单晶硅表面上全氟癸酸单层膜

作     者：任嗣利 杨生荣 薛群基 REN Si-Li;YANG Sheng-Rong;XUE Qun-ji

作者机构：中国科学院兰州化学物理研究所固体润滑国家重点实验室甘肃兰州730000 

出 版 物：《物理化学学报》 (Acta Physico-Chimica Sinica)

年 卷 期：2001年第17卷第2期

页      面：97-100页

核心收录：

学科分类：081704[工学-应用化学] 07[理学] 070304[理学-物理化学(含∶化学物理)] 08[工学] 0817[工学-化学工程与技术] 0703[理学-化学] 070301[理学-无机化学] 

基　　金：国家重点自然科学基金资助项目!( 50023001)&& 

主　　题：自组装单分子膜 XPS 接触角测量 全氟癸酸 聚乙烯亚胺 有机超薄膜 

摘      要：Ultra-thin film of perfluorodecanoic acid expected to be excellent lubricant for micro-machines was prepared successfully on single crystal silicon *** film was characterized by means of X-ray photoelectron spectroscopy (XPS) and contact-angle *** chemical reaction involved in the preparation of the ultra-thin film was discussed as *** being immersed in a dilute aqueous solution of polyethyleneimine (PEI) for 15 minutes and rinsed with distilled water,the silicon substrate was coated with a thin film of PEI,which was then put into a dilute solution (1× 10－ 3 mol· L－ 1) of perfluorodecanoic acid in *** the steady perfluorodecanoic acid ultra-thin film was developed on PEI coating in the presence of a covalent amide bond between carboxylic group and the primary or secondary amine groups of *** process was accompanied by the contact angle changes of water droplet on the Si surface (see Table 1).Moreover,the reaction between perfluorodecanoic acid and PEI was significantly influenced by N,N′-dicyclohexylcarbodiimide (DCCD).The contact angle on the ultra-thin film of perfluorodecanoic acid is only 66.3° in the absence of DCCD in the reacting solution; it rises to 89.4° in the presence of *** indicates that the reaction between perfluorodecanoic acid and PEI was accelerated by DCCD,and the quality of perfluorodecanoic acid ultra-thin film thus *** analysis of the ultra-thin film indicates that the derivatization of PEI with perfluorodecanoic acid was accompanied by several ***,a large and highly symmetrical F 1s peak appeared at 688.3 eV (C－ F* ).Secondly,a new peak of N 1s appeared at 400.7 eV (chemical shift 1.4 eV),which was attributed to the N atom attached to the carbonyl group (O=C－ N* ).Thirdly,three new peaks of C 1s appeared at 286.1 eV (chemical shift 1.5 eV),288.1 eV (chemical shift 3.5 eV),and 291.0 eV (chemical shift 5.4 eV),*** C 1s peaks were attributed to the C atom att